Jieyang Wang

Mr. Jieyang Wang


Research Focus & Metrics

Academic Career Length

2Years (2025-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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25 June 2025 in Micromachines
Verified
Journal Article
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JWJieyang Wang
Jieyang Wang
LGLiang Guo
Liang Guo
XCXuefeng Chu
Xuefeng Chu
FYFan Yang
Fan Yang
HGHansong Gao
Hansong Gao
XYXiaotian Yang
Xiaotian Yang
In this study, zinc–tin oxide (ZTO) thin films were prepared via radio-frequency magnetron sputtering to examine the influence of annealing temperature on the performance of thin-film transistors (TFTs) and their resistive-load inverters. The findings reveal that annealing modulates the concentration and spatial distribution of oxygen vacancies (VO), which directly affect carrier density and interface trap density, ultimately determining the electrical behavior of inverters. At the optimal annealing temperature of 600 °C, the VO concentration was effectively moderated, resulting in a TFT with a mobility of 12.39 cm2 V−1 s−1, a threshold voltage of 6.13 V, an on/off current ratio of 1.09 × 108, and a voltage gain of 11.77 in the corresponding inverter. However, when the VO concentration deviated from this optimal range, whether in excess or deficiency, the gain was reduced and power consumption increased. This VO engineering strategy enables the simultaneous optimization of both TFT and inverter performance without relying on rare elements, offering a promising pathway toward the development of low-cost, large-area, flexible, and transparent electronic devices.

7 September 2025 in Micromachines
Verified
Journal Article
Open access
PDF file
YZYang Zhao
Yang Zhao
CWChao Wang
Chao Wang
LKLaizhe Ku
Laizhe Ku
LGLiang Guo
Liang Guo
XCXuefeng Chu
Xuefeng Chu
XYXiaotian Yang
Xiaotian Yang
In the era of artificial intelligence, neuromorphic devices that simulate brain functions have received increasingly widespread attention. In this paper, an artificial neural synapse device based on ZnAlSnO thin-film transistors was fabricated, and its electrical properties were tested: the current-switching ratio was 1.18 × 107, the subthreshold oscillation was 1.48 V/decade, the mobility was 2.51 cm2V−1s−1, and the threshold voltage was −9.40 V. Stimulating artificial synaptic devices with optical signals has the advantages of fast response speed and good anti-interference ability. The basic biological synaptic characteristics of the devices were tested under 365 nm light stimulation, including excitatory postsynaptic current (EPSC), paired-pulse facilitation (PPF), short-term plasticity (STP), and long-term plasticity (LTP). This device shows good synaptic plasticity. In addition, by changing the gate voltage, the excitatory postsynaptic current of the device at different gate voltages was tested, two different logical operations of “AND” and “OR” were achieved, and the influence of different synaptic states on memory was simulated. This work verifies the application potential of the device in the integrated memory and computing architecture, which is of great significance for promoting the high-quality development of neuromorphic computing hardware.