A high-performance ZnSnO (ZTO) thin-film transistor (TFT) was fabricated, with ZTO deposited by rf magnetron sputtering. XPS was used to analyze and study the effects of different annealing temperatures on the element composition and valence state of ZTO films. Then, the influence mechanism of annealing treatment on the electrical properties of ZTO thin films was analyzed. The results show that, with an increase in annealing temperature, the amount of metal bonding with oxygen increases first and then decreases, while the oxygen vacancy decreases first and then increases. Further analysis on the ratio of Sn²⁺ is presented. Electrical results show that the TFT annealed at 600 °C exhibits the best performance. It exhibits high saturation mobilities (μ_SAT) up to 12.64 cm²V⁻¹s⁻¹, a threshold voltage (V_TH) of −6.61 V, a large on/off current ratio (I_on/I_off) of 1.87 × 10⁹, and an excellent subthreshold swing (SS) of 0.79 V/Decade.

The electrical, stability and optoelectronic properties of GZTO TFTs with different Ga doping concentrations were investigated. Active layers were prepared by co-sputtering GaO and ZTO targets with different sputtering powers. The experimental results show that the surface of GZTO films is smooth, which is favorable for stability. The off-state current is reduced by a factor of 10, the switching ratio is increased to 1.59 × 10⁸, and the threshold voltage shift is reduced in PBS and NBS tests. In addition, the transmittance of all devices is greater than 80% in the visible range, and the optical bandgap of the TFTs is increased from 3.61 eV to 3.84 eV after Ga doping. The current enhancement of the GZTO TFTs is more pronounced under UV irradiation, with higher responsiveness and better-sustained photoconductivity. It is proved that Ga doped into ZTO as a carrier suppressor can better combine with oxygen vacancies and reduce the concentration of oxygen vacancies and oxygen defects compared with Zn and Sn atoms, thus improving stability. GaO, as a wide bandgap material, can improve the optical bandgap of GZTO TFTs so that they can better absorb the light in the UV wavelength band, and they can be used in the field of UV photodetection.

In this study, zinc–tin oxide (ZTO) thin films were prepared via radio-frequency magnetron sputtering to examine the influence of annealing temperature on the performance of thin-film transistors (TFTs) and their resistive-load inverters. The findings reveal that annealing modulates the concentration and spatial distribution of oxygen vacancies (V_O), which directly affect carrier density and interface trap density, ultimately determining the electrical behavior of inverters. At the optimal annealing temperature of 600 °C, the V_O concentration was effectively moderated, resulting in a TFT with a mobility of 12.39 cm² V⁻¹ s⁻¹, a threshold voltage of 6.13 V, an on/off current ratio of 1.09 × 10⁸, and a voltage gain of 11.77 in the corresponding inverter. However, when the V_O concentration deviated from this optimal range, whether in excess or deficiency, the gain was reduced and power consumption increased. This V_O engineering strategy enables the simultaneous optimization of both TFT and inverter performance without relying on rare elements, offering a promising pathway toward the development of low-cost, large-area, flexible, and transparent electronic devices.

The primary objective of this research paper is to explore strategies for enhancing the electrical performance of dual active layer thin film transistors (TFTs) utilizing LZTO/ZTO as the bilayer architecture. By systematically adjusting the thickness of the active layers, we achieved significant improvements in the performance of the LZTO/ZTO TFTs. An XPS analysis was performed to elucidate the impact of the varying O₂ element distribution ratio within the LZTO/ZTO bilayer thin film on the TFTs performance, which was directly influenced by the modification in the active layer thickness. Furthermore, we utilized atomic force microscopy to analyze the effect of altering the active layer thickness on the surface roughness of the LZTO/ZTO bilayer film and the impact of this roughness on the TFTs electrical performance. Through the optimization of the ZTO active layer thickness, the LZTO/ZTO TFT exhibited an mobility of 10.26 cm² V⁻¹ s⁻¹ and a switching current ratio of 5.7 × 10⁷, thus highlighting the effectiveness of our approach in enhancing the electrical characteristics of the TFT device.

In the era of artificial intelligence, neuromorphic devices that simulate brain functions have received increasingly widespread attention. In this paper, an artificial neural synapse device based on ZnAlSnO thin-film transistors was fabricated, and its electrical properties were tested: the current-switching ratio was 1.18 × 10⁷, the subthreshold oscillation was 1.48 V/decade, the mobility was 2.51 cm²V⁻¹s⁻¹, and the threshold voltage was −9.40 V. Stimulating artificial synaptic devices with optical signals has the advantages of fast response speed and good anti-interference ability. The basic biological synaptic characteristics of the devices were tested under 365 nm light stimulation, including excitatory postsynaptic current (EPSC), paired-pulse facilitation (PPF), short-term plasticity (STP), and long-term plasticity (LTP). This device shows good synaptic plasticity. In addition, by changing the gate voltage, the excitatory postsynaptic current of the device at different gate voltages was tested, two different logical operations of “AND” and “OR” were achieved, and the influence of different synaptic states on memory was simulated. This work verifies the application potential of the device in the integrated memory and computing architecture, which is of great significance for promoting the high-quality development of neuromorphic computing hardware.