Lixiaona Li

Ms. Lixiaona Li

orcid

Research Focus & Metrics

Academic Career Length

2Years (2025-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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17 July 2025 in Coatings
Verified
Journal Article
Open access
PDF file
HYHongjuan Yan
Hongjuan Yan
WHWang Haoran
Wang Haoran
LLLixiaona Li
Lixiaona Li
ZDZhaoliang Dou
Zhaoliang Dou
LBLiu fen Bin
Liu fen Bin
The impact of modulation periods on the microstructure, as well as the tribological and mechanical characteristics of the AlCrTiVNbN/TiSiN nano multilayer films, was investigated. The films were prepared with modulation periods ranging from 4 nm to 7 nm, and their properties were explored using X-ray diffraction (XRD), scanning electron microscope (SEM), nanoindentation, and a tribological tester. All nano multilayer films revealed a face-centered cubic (FCC) structure with a preferred planar direction of (200). As the modulation period increased, the XRD peak moved to higher angles, and the interplanar distance decreased. Also, the mechanical properties deteriorated, and the COF rose monotonically as a result. The nano multilayer film with a modulation period equal to 4 nm exhibited a smooth surface with minimal small particles, the highest hardness of 15.51 ± 0.16 GPa and elastic modulus of 182.89 ± 2.38 GPa, the highest values for the ratios of H/E and H3/E2, the lowest average friction coefficient of 0.73, and a wear rate equal to (8.2 9 ± 0.18) × 10−8 mm3·N−1·m−1. The improvement in the properties of the film was ascribed to the coherent growth and alternating stress field between the AlCrTiVNbN and TiSiN layers.

30 November 2025 in Lubricants
Verified
Journal Article
Open access
PDF file
LSLina Si
Lina Si
WHWang Haoran
Wang Haoran
HYHongjuan Yan
Hongjuan Yan
LLLixiaona Li
Lixiaona Li
LBLiu fen Bin
Liu fen Bin
CZCaili Zheng
Caili Zheng
FeCoCrNiNbxN (x = 0, 0.25, 0.5, 0.75, 1 molar) high-entropy nitride (HEN) films were fabricated on 304 stainless steel and Si wafers using magnetron sputtering to investigate the influence of Nb content on the microstructure, mechanical properties, and tribological performance. X-ray diffraction (XRD) analysis reveals a face-centered cubic (FCC) structure with a preferred orientation in the (200) plane, which transfers to the (111) plane as the Nb content increases. The lattice distortion induced by Nb incorporation enhanced crystallinity, with the Nb0.5N film exhibiting the highest diffraction peak intensity and interplanar distance. Cross-sectional SEM images displayed columnar crystal structures, while the surface morphology evolved from “cauliflower-like” to smoother clusters with increasing Nb content, reducing average roughness from 7.54 nm (Nb0) to 4.89 nm (Nb1). The hardness and elastic modulus initially decrease, then peak at 25.56 GPa and 265.36 GPa, respectively, for the Nb1 film, attributed to solid solution strengthening and high-entropy effects. Tribological tests demonstrated that Nb1 achieved the lowest coefficient of friction (0.46), wear volume (1.23 × 10−3 mm3), and wear rate (5.11 × 10−8 mm3·N−1·m−1), owing to NbN phase formation, refined grains, and reduced surface roughness. The wear mechanisms are abrasive and oxidative wear.

4 July 2026 in Vacuum
Verified
Journal Article
Closed access
HYHongjuan Yan
Hongjuan Yan
LLLixiaona Li
Lixiaona Li
HWHaoran Wang
Haoran Wang
ZDZhaoliang Dou
Zhaoliang Dou
LSLina Si
Lina Si
FLFengbin Liu
Fengbin Liu

9 September 2026 in Coatings
Verified
Journal Article
Open access
PDF file
HYHongjuan Yan
Hongjuan Yan
LLLixiaona Li
Lixiaona Li
ZDZhaoliang Dou
Zhaoliang Dou
Ye YangYe Yang
Ye Yang
LSLina Si
Lina Si
LBLiu fen Bin
Liu fen Bin
Cavitation erosion severely limits the service life of marine hydraulic components. Magnetron sputtering was utilized to fabricate TiSiN/AlCrTiVNbN high-entropy nitride nanomultilayer films, whose modulation periods ranged from 4 nm to 23 nm. The effects of modulation period on the microstructure, mechanical properties, and cavitation erosion resistance were systematically investigated. All films exhibited a single-phase face-centered cubic structure with a preferred orientation (200) plane. The film with a 6 nm layer period reached the highest hardness (38.9 GPa) and elastic modulus (214.1 GPa), which is due to the many closely fitting interfaces that effectively stopped line defect movement; in cavitation erosion tests in 3.5% salt water, this film had the lowest mass loss (0.8 mg) and its surface stayed in the best condition. Its superior cavitation erosion resistance originates from the synergistic effects of high-density coherent interfaces that obstructed crack propagation, enhanced mechanical properties that provided excellent resistance to plastic deformation, and the formation of a protective oxide layer during cavitation. As this work shows, optimizing the layer period is an effective strategy; it allows the design of strong protective films for ocean use.

28 February 2026 in SSRN Electronic Journal
Verified
Preprint
Open access
HYHongjuan Yan
Hongjuan Yan
LLLixiaona Li
Lixiaona Li
HWHaoran Wang
Haoran Wang
ZDZhaoliang Dou
Zhaoliang Dou
LSLina Si
Lina Si
FLFengbin Liu
Fengbin Liu
Cavitation erosion is one of the main failure reasons for the parts of the marine equipment. The deposition of films is an efficient technique to enhance the cavitation erosion resistance (CER) of the parts. The TiSiN/NiTiAl0.8CrCoN films with various modulation periods were fabricated on the substrates. The mechanical characteristics, the microstructure, and CER properties of the TiSiN/NiTiAl0.8CrCoN films were studied. The prepared films display a face-centered cubic (FCC) phase with the preferred orientation of (200) plane. As the modulation periods of the films increase, the mechanical properties improve initially and then exhibit deterioration. Conversely, the mass loss in the cavitation erosion experiments decline initially and then follow an increasing trend as the modulation period of the TiSiN/NiTiAl0.8CrCoN film increase, with the highest CER properties achieve at a modulation period equal to 8 nm. The reasons of the improving properties of films are the solution strengthening, the epitaxial growth and the alternating stress field.