The nucleation site plays a critical role in achieving the full coverage of perovskite film at both the macroscopic and microscopic scales, and it is systematically investigated for the first time in this study. The results show that under natural conditions, the incomplete coverage of perovskite film is due to both heterogeneous nucleation and homogeneous nucleation. The established concentration field and temperature field in the precursor solution show that there are two preferential nucleation sites, i.e., the upper surface of the precursor solution (homogeneous nucleation) and the surface of the substrate (heterogeneous nucleation). The nucleation sites are tuned by decreasing the drying pressure from the atmosphere to 3000 Pa, and then to 100 Pa, and then the microstructures of the perovskite films change from an incomplete coverage state to a monolayer full coverage state, and then to a bilayer full coverage state. At last, when the full coverage perovskite films are assembled into perovskite solar cells, the photovoltaic performance of the monolayer perovskite solar cells is slightly greater than that of the bilayer perovskite solar cells. The electrochemical characterization shows that there is more restrained internal recombination of the monolayer perovskite solar cells compared with bilayer perovskite solar cells.

A Finite-Element Model (FEM) for thermal-barrier coatings was employed to elaborate the temperature distribution on yttria-stabilized zirconia (YSZ) free surface during cracks coalescing, then the influence of sintering of YSZ induced by heat-transfer overlapping on energy release rate was quantificationally evaluated. A three-dimensional model including three layers was fabricated. Two types of cracks, with and without depth variations in YSZ coating, were introduced into the model, respectively. The temperature rise of YSZ coating over the crack is independent of each other at the beginning of crack propagation. As crack distance shortens, the independent temperature-rise regions begin to overlap, while maximum temperature is still located at the crack center before crack coalescence. The critical distance that the regions of temperature rise, just overlapping, is the sum of half lengths of two coalescing cracks (i.e., a₁ + a₂), which is independent of cracking path. The maximum temperature in YSZ sharply increases once cracks coalesce. Compared with one delamination crack, the effective energy-release rate induced by heat-transfer overlapping increases in the range of 0.2%–15%, depending on crack length and crack distance, which is on some level comparable to that of deterioration of thermal expansion misfit induced by temperature jump between crack faces.

Silane-based passivation films have been widely utilized for corrosion protection in metal materials. In order to further improve the anticorrosion performance of the silane passivation film, this paper adopts the hydrolysis method to add graphene oxide (GO) to the silane coupling agent (3-(2,3-glycidoxy)propyltrimethoxysilane) (KH560). The synthesized KH560-GO passivation solution was then mixed with epoxy resin (EP) to prepare a silane composite passivation film layer (KH560-GO/EP) containing GO and epoxy resin. For comparison, EP and KH560-GO films were also prepared, and the corrosion performance of the composite film was compared with that of the single film. The structure of the KH560-GO film was characterized by X-ray diffraction analyzer (XRD) and infrared spectroscopy (FTIR). The microstructure of the composite film was analyzed by scanning electron microscopy (SEM), while its corrosion resistance was tested through polarization curves and electrochemical impedance spectroscopy (EIS). Additionally, neutral salt spray tests were conducted to evaluate the corrosion resistance of the samples, and rubber wiping tests were performed to assess the adhesion of the film. The results demonstrated that the KH560-GO/EP film exhibited a higher corrosion potential (E_corr) of −0.239 V compared to the EP and KH560-GO films, along with the lowest self-corrosion current density (I_corr) of 6.157 × 10⁻⁷ A/cm². These findings indicate that the KH560-GO/EP film possesses excellent corrosion resistance. The results showed that the corrosion potential (E_corr) of the KH560-GO/EP film was higher than that of EP and KH560-GO film layer is −0.239 V, and the self-corrosion current density (I_corr) is the smallest, which is 6.157 × 10⁻⁷ A/cm². The KH560-GO/EP film layer shows excellent corrosion resistance. Experiments show that the KH560-GO/EP passivated film has excellent bonding properties and corrosion resistance.