This work summarizes the different natural lighting systems applied for pollutant treatment systems using photocatalysis. The principles and fundamentals of the technologies used are revisited and examples of technologies most used for treatment either at the laboratory or at the pilot plant level are disclosed. This unveils a general panorama of treatment technologies via photocatalysis, using natural sunlight as an illumination source. Aside from these concentrated solar power systems that are inviable for photocatalytic aqueous treatments, reported scientific works are shown about heliostats, parabolic troughs, Fresnel lenses, and direct illuminated systems. As a valuable result of this review, the power used in photocatalytic systems requires higher attention not only in these systems but in laboratories and prototypes. Photocatalysts and their countless configuration variants are limited due to the potential barriers in particle borders, interfaces, and surfaces to cause redox reactions in water and pollutant target molecules. These factors reduce photocatalyst efficiencies for converting light energy to useful electron pair charge carriers for water treatments. The use of solar concentration systems applied to photocatalytic treatment systems can generate enough charge carriers, improving the efficiency of the systems, and making it feasible to scale up various configurations of this treatment pathway. Subsequently, the photocatalyst material and light are both important.

Aims: This work uses the MACE method to synthesize SiNWs- NiNPs/NiONPs to degrade organic pollutants by photocatalysis. Background: Photocatalytic degradation has been applied as an attractive solution to remove several organic pollutants. Heterostructured nanomaterials have become an interesting platform for investigation. Metal-assisted chemical etching (MACE) stands out as a promising technique because it is simple, low cost, and fast. Objective: Attain the degradation of methyl orange (MO) in the presence of silicon nanowires (SiNWs) in heterojunction with Nickel/Nickel Oxide nanoparticles (NiNPs-NiONPs). Methods: SiNWs were synthesized by metal (Ag) assisted chemical etching (MACE) of monocrystalline silicon wafers. NiNPs were non-electrolytically deposited on the SiNWs (electroless method). The morphology of the SiNWs- NiNPs/NiONPs was observed by SEM. Results: Heterogeneous photocatalytic degradation of methyl orange (C14H14N3NaO3S) in an aqueous solution at a concentration of 20 ppm had an efficiency of 66.5% after 180 min under UV irradiation. The MO degradation percentage was determined using UV-visible spectrophotometry. Conclusion: The SiNWs-NiNPs/NiONPs were obtained composed mainly of Si covered by SiO2 decorated on the tips with Ni (II) in the form of NiO and a small amount of nickel metal. The removal efficiency obtained at 180 min of light exposure was 66.5%. After the photocatalysis tests, further oxidation of the NiNPS into NiONPS, was attributed to the reactive oxygen species in the aqueous medium based on the changes of the oxygen and Ni2p3/2 peaks by XPS. Other: Through XPS, the oxidation state of the SiNWs- NiNPs/NiONPs was analyzed.

Photocatalytic semiconductors require maintaining stability and pursuing higher efficiencies. The studied systems were silicon nanowires (Si_NWs), silicon nanowires with cobalt oxide nanoparticles (Si_NWs-CoO_NPs), and silicon nanowires with copper nanoparticles (Si_NWs-Cu_NPs). Si_NWs were synthesized by metal-assisted chemical etching (MACE) from silicon wafers keeping the remaining silver nanoparticles for all three sample types. The nanowires were about 23–30 µm in length. CoO_NPs and Cu_NPs were deposited on Si_NWs by the autocatalytic reduction processes (electroless). There were many factors in the process that affect the resulting structures and degradation efficiencies. This work shows the degradation of methyl orange (MO) together with the chemisorption of methylene blue (MB), and rhodamine 6G (Rh6G) by direct illumination with visible radiation. The MO degradation kinetics were in the sequence Si_NWs-Cu_NPs (88.9%) > Si_NWs (85.3%) > Si_NWs-CoO_NPs (49.3%), with the Si_NWs-Cu_NPs having slightly faster kinetics. However, Si_NWs-CoO_NPs have slow degradation kinetics. The chemisorptions of MB and Rh6G were Si_NWs-Cu_NPs (87.2%; 86.88%) > Si_NWs (86%; 87%) > Si_NWs-CoO_NPs (17.3%; 12%), showing dye desorptions together with lower chemisorption capacities. This work shows iridescence in optical microscopy images by the visible light interference caused by the spaces between the nanowire bundles.

A plastic injection waste known as “purge” cannot be reintegrated into the recycling chain due to its shape, size, and composition. Grinding these cannot be carried out with traditional mills due to significant variations in size and shape. This work proposes a process and the design of a device that operates with solar energy to cut the purges without exceeding the degradation temperature. The size reduction allows reprocessing, revalorization, and handling. The purges are mixtures of processed polymers, so their characterization information is unavailable. Some characterizations were conducted before the design of the process and after the cut of the purges. Some of the most representative purges in a recycling company were evaluated. The flame test determines that all material mixtures retain thermoplasticity. The hardness (Shore D) presented changes in four of the purges being assessed, with results in a range of 59–71 before softening and 60–68 after softening. Young’s modulus was analyzed by the impulse excitation technique (IET), which was 2.38–3.95 GPa before softening and 1.7–4.28 after softening. The feasibility of cutting purges at their softening temperature was evaluated. This was achieved in all the purges evaluated at 250–280 °C. FTIR allowed for corroboration of no significant change in the purges after softening. The five types of purges evaluated were polypropylene-ABS, polycarbonate-ABS-polypropylene, yellow nylon 66, acetal, and black nylon 66 with fillers, and all were easily cut at their softening temperature, allowing their manipulation in subsequent process steps.

This work proposes for the first time protecting–reflecting on both sides of plated mirrors and a solution to polycarbonate surface vulnerability to weathering and scratching using tungsten disulfide (WS₂) by mechanical polishing. The ability of the dynamic chemical plating (DCP) technique to deposit Ag films at the nanometer scale on a polycarbonate (PC) substrate and its characteristics to be metallized is also shown. These deposits hold significant promise for concentrated solar power (CSP) applications. Complementarily, the application of WS₂ as a reflective film for CSP by mechanical polishing on smooth polycarbonate surfaces is both novel and practical. This technique is innovative and scalable without needing reactants or electrical potential, making it highly applicable in real-world scenarios, including, potentially, on-site maintenance. The effects of surface morphology and adhesion, and the reflectivity parameters of the silver metallic surfaces were investigated. Wettability was investigated because it is important for polymeric surfaces in the activation and metal deposition immediately after redox reactions. The flame technique improved wettability by modifying the surface with carbonyl and carboxyl functional groups, with PC among the few industrial polymers that resisted such a part of the process. The change in the chemical composition, roughness, and wettability of the surfaces effectively improved the adhesion between the Ag film and the PC substrate. However, it did not significantly affect the adhesion between PC and WS₂ and showed its possible implementation as a first surface mirror. Overall, this work provides a scalable, innovative method for improving the durability and reflectivity of polycarbonate-based mirrors, with significant implications for CSP applications.