This review summarizes the evolution of magnetron sputter physical vapor deposition (PVD-MS) for manufacturing thin-coating Reference Materials (RMs) over the past 5 decades. It discusses progress from fundamental models like Thornton’s Zone Diagram to modern innovations such as HiPIMS and the integration of artificial intelligence (AI). It assesses improvements in homogeneity and stability and compares PVD-MS with other methods (CVD, ALD, and ECD). It highlights its balance between precision, versatility, and scalability. It also discusses current challenges, such as defect control and the need to include surface roughness in uncertainty calculations. The article concludes that PVD-MS, especially with the support of AI, is an indispensable technology for future certified thickness standards.

The study of Cu-doped BiMnO 3 is found to allow the observation of the structural and magnetic properties. The increase in Cu content causes a decrease in crystallite size as determined by the powder X-ray diffraction technique. To reinforce experimental results, first-principles calculations of the electronic structure were carried out using density functional theory (DFT), with the Vienna Ab Initio Simulation Package (VASP). The electronic structure has been calculated by means of the projector-augmented-wave (PAW) method within the GGA exchange-correlation energy in the Perdew–Burke–Ernzerhof (PBE) approach, and a local Hubbard-U (GGA + U) was also added to the transition metal atom (Mn), as it is well known to give better results for strongly correlated systems. We found that Cu-dopant and Mn atoms couple antiferromagnetically, causing a reduced magnetic moment, in agreement with the experimental measurements of magnetic hysteresis loops. It is important to know the effect of the doping agent on the electronic and magnetic properties of the material for its possible applications.