In this paper, a metal-dielectric-metal structure based on a Fabry–Perot cavity was proposed, which can provide near 100% perfect narrow-band absorption. The lossy ultrathin silver film was used as the top layer spaced by a lossless silicon oxide layer from the bottom silver mirror. We demonstrated a narrow bandwidth of 20 nm with 99.37% maximum absorption and the absorption peaks can be tuned by altering the thickness of the middle SiO₂ layer. In addition, we established a deep understanding of the physics mechanism, which provides a new perspective in designing such a narrow-band perfect absorber. The proposed absorber can be easily fabricated by the mature thin film technology independent of any nano structure, which make it an appropriate candidate for photodetectors, sensing, and spectroscopy.

Broadband antireflection (AR) coatings are essential elements for improving the photocurrent generation of photovoltaic modules or the enhancement of visibility in optical devices. In this paper, we report a hybrid nanostructured antireflection coating combination that is a clean and efficient method for fabricating a nanostructured antireflection coating (ARC). A multilayer thin-film was introduced between the ARC and substrate to solve the significant problem of preparing nanostructured ARCs on different substrates. In this way, we rebuilt a gradient refractive index structure and optimize the antireflective property by simply adjusting the moth-eye structure and multilayers. Subwavelength-structured cone arrays were directly patterned using a self-assembled single-layer polystyrene (PS) nanosphere array as an etching mask. Nanostructure coatings exhibited excellent broadband and wide-angle antireflective properties. The bottom-up preparation process and hybrid structural combination have the potential to significantly enhance the broadband and wide-angle antireflective properties for a number of optical systems that require high transparency, which is promising for reducing the manufacturing cost of nanostructured AR coatings.

Tunable perfect absorption is achieved in a self-assembled nano-hole array, which provides a new perspective in designing this kind of absorber.

Broadband anti-reflection (AR) coatings are essential elements for improving the photocurrent generation of photovoltaic modules and enhancing visibility in optical devices. In this paper, we report a hybrid-structured, anti-reflection coating that combines multi-layer thin films with a single top-oblique deposited layer. By simply introducing this low-refractive index layer, the broadband anti-reflection properties of optical thin films can be improved while simplifying the preparation. Precise time-controlled and oblique-angle deposition (OAD) methods were used to fabricate the broadband AR coating. By accurately measuring and adjusting the design errors for the thin and thick film layers, 22-layer and 36-layer AR coatings on a sapphire substrate with a 400–2000 nm wideband were obtained. This bottom-up preparation process and AR coating design have the potential to significantly enhance the broadband antireflective properties for many optical systems and reduce the manufacturing cost of broadband AR coatings.

In this paper, we proposed a triple layer structure consisting of the bottom silver layer, thin silicon oxide space layer, and ultrathin semiconductor silicon film with nano hole array achieving three absorption peaks with narrow band. The absorption spectrum can be easily controlled by adjusting the structural parameters including the radius and period of the nano hole array, and the maximal absorption can reach 99.0% and the narrowest full width of half maximum can reach about 6.5 nm in theory. We also clarified the physical mechanism of the proposed structure in details by finite-difference time-domain simulation, in which the three narrow band perfect adsorption peaks can be attributed to electric dipole resonance, magnetic dipole resonance and plasmonic resonance respectively. At the same time, we used a low-cost nanosphere lithography method to fabricate the proposed nano hole array in large area. In experiment, the absorption peak of the proposed triple layer structure can reach up to 98.3% and the narrowest full width of half maximum can reach up to about 10.1 nm. The highest quality factor Q can reach up to 98.4. This work can open a new avenue for high-quality factor narrow band perfect absorption using ultrathin semiconductor film and benefit for many fields such as infrared sensors, plasmonic filters, and hyperspectral imaging.

Polymethyl methacrylate (PMMA) is an attractive optical plastic that is widely used in augmented reality, virtual reality devices, display, wearable devices, portable optical equipment, and lightweight optics. Thin film prepared by physical vapor deposition (PVD) is the primary choice of coating on PMMA. However, it faces problems with coating adhesion and stress. In this paper, we analyze the problems existing in the current PMMA high-reflection (HR) coating in detail and propose a way to effectively solve issues with bonding force and stress. Based on the current research background, the bonding force was enhanced by introducing a special hard coating as the connection layer between the dielectric film and the substrate. After comparing the stresses of different coating materials and material combinations, the optimal combination of Nb₂O₅ and SiO₂ was determined, and the requirements were successfully prepared. An HR coating that satisfies requirements, with low stress and excellent environmental adaptability, was successfully prepared. Based on this, a broadband HR coating from 750 to 1550 nm was formed on the surface of PMMA by adjusting the partial pressure of oxygen.