In this paper, a metal-dielectric-metal structure based on a Fabry–Perot cavity was proposed, which can provide near 100% perfect narrow-band absorption. The lossy ultrathin silver film was used as the top layer spaced by a lossless silicon oxide layer from the bottom silver mirror. We demonstrated a narrow bandwidth of 20 nm with 99.37% maximum absorption and the absorption peaks can be tuned by altering the thickness of the middle SiO₂ layer. In addition, we established a deep understanding of the physics mechanism, which provides a new perspective in designing such a narrow-band perfect absorber. The proposed absorber can be easily fabricated by the mature thin film technology independent of any nano structure, which make it an appropriate candidate for photodetectors, sensing, and spectroscopy.

Broadband antireflection (AR) coatings are essential elements for improving the photocurrent generation of photovoltaic modules or the enhancement of visibility in optical devices. In this paper, we report a hybrid nanostructured antireflection coating combination that is a clean and efficient method for fabricating a nanostructured antireflection coating (ARC). A multilayer thin-film was introduced between the ARC and substrate to solve the significant problem of preparing nanostructured ARCs on different substrates. In this way, we rebuilt a gradient refractive index structure and optimize the antireflective property by simply adjusting the moth-eye structure and multilayers. Subwavelength-structured cone arrays were directly patterned using a self-assembled single-layer polystyrene (PS) nanosphere array as an etching mask. Nanostructure coatings exhibited excellent broadband and wide-angle antireflective properties. The bottom-up preparation process and hybrid structural combination have the potential to significantly enhance the broadband and wide-angle antireflective properties for a number of optical systems that require high transparency, which is promising for reducing the manufacturing cost of nanostructured AR coatings.

Broadband anti-reflection (AR) coatings are essential elements for improving the photocurrent generation of photovoltaic modules and enhancing visibility in optical devices. In this paper, we report a hybrid-structured, anti-reflection coating that combines multi-layer thin films with a single top-oblique deposited layer. By simply introducing this low-refractive index layer, the broadband anti-reflection properties of optical thin films can be improved while simplifying the preparation. Precise time-controlled and oblique-angle deposition (OAD) methods were used to fabricate the broadband AR coating. By accurately measuring and adjusting the design errors for the thin and thick film layers, 22-layer and 36-layer AR coatings on a sapphire substrate with a 400–2000 nm wideband were obtained. This bottom-up preparation process and AR coating design have the potential to significantly enhance the broadband antireflective properties for many optical systems and reduce the manufacturing cost of broadband AR coatings.

Polymethyl methacrylate (PMMA) is an attractive optical plastic that is widely used in augmented reality, virtual reality devices, display, wearable devices, portable optical equipment, and lightweight optics. Thin film prepared by physical vapor deposition (PVD) is the primary choice of coating on PMMA. However, it faces problems with coating adhesion and stress. In this paper, we analyze the problems existing in the current PMMA high-reflection (HR) coating in detail and propose a way to effectively solve issues with bonding force and stress. Based on the current research background, the bonding force was enhanced by introducing a special hard coating as the connection layer between the dielectric film and the substrate. After comparing the stresses of different coating materials and material combinations, the optimal combination of Nb₂O₅ and SiO₂ was determined, and the requirements were successfully prepared. An HR coating that satisfies requirements, with low stress and excellent environmental adaptability, was successfully prepared. Based on this, a broadband HR coating from 750 to 1550 nm was formed on the surface of PMMA by adjusting the partial pressure of oxygen.

We report a theoretical study of a perfect absorber based on the metal-insulator-metal (MIM) structure, which achieves perfect absorption of single and double peaks in the visible range. The top Ag and middle SiO ₂ are arranged in a periodic nanopillar array. Adjusting the structural parameters of the nanopillars to indirectly control the absorption spectrum, theoretically the maximum single-peak absorption can reach more than 99.0% and the maximum double-peak absorption can reach more than 90.0%. We investigate its absorption mechanism through simulations and calculations, and explain the results well with the SPP scattering mode and F-P cavity theory. We find that through the double-peak absorption process, the mode split phenomenon appears as the thickness of SiO ₂ increases. Therefore, the selective appearance of absorption peaks can be achieved, which provides the possibility of application in absorbers.

In this study, we propose and fabricate a perfect absorber on a planar substrate using alternate silicon dioxide and ultrathin metallic lossy chromium (Cr) films. Furthermore, we transfer the absorber to a curved substrate via an optimization design of symmetric structures. The absorber exhibits a highly efficient absorption and large incident-angular tolerance characteristics in the whole visible region. We investigate each layer contribution to the absorption theoretically, and find that ultrathin (~5 nm) lossy Cr films play a dominant absorptive role. Using the effective interface method, we calculate the phase difference on the lossy Cr front surface. It is close to the destructive interference condition, from which we clarify why the proposed structures can produce a highly efficient absorption.