Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many applications owing to its distinct abilities. They include uniform deposition of conformal films with controllable thickness, even on complex three-dimensional surfaces, and can improve the efficiency of electronic devices. This technology has attracted significant interest both for fundamental understanding how the new functional materials can be synthesized by ALD and for numerous practical applications, particularly in advanced nanopatterning for microelectronics, energy storage systems, desalinations, catalysis and medical fields. This review introduces the progress made in ALD, both for computational and experimental methodologies, and provides an outlook of this emerging technology in comparison with other film deposition methods. It discusses experimental approaches and factors that affect the deposition and presents simulation methods, such as molecular dynamics and computational fluid dynamics, which help determine and predict effective ways to optimize ALD processes, hence enabling the reduction in cost, energy waste and adverse environmental impacts. Specific examples are chosen to illustrate the progress in ALD processes and applications that showed a considerable impact on other technologies.

With the increasing demand for low-cost and environmentally friendly energy, the application of rechargeable lithium-ion batteries (LIBs) as reliable energy storage devices in electric cars, portable electronic devices and space satellites is on the rise. Therefore, extensive and continuous research on new materials and fabrication methods is required to achieve the desired enhancement in their electrochemical performance. Battery active components, including the cathode, anode, electrolyte, and separator, play an important role in LIB functionality. The major problem of LIBs is the degradation of the electrolyte and electrode materials and their components during the charge‒discharge process. Atomic layer deposition (ALD) is considered a promising coating technology to deposit uniform, ultrathin films at the atomic level with controllable thickness and composition. Various metal films can be deposited on the surface of active electrodes and solid electrolyte materials to tailor and generate a protective layer at the electrode interface. In addition, synthesis of microbatteries and novel nanocomplexes of the cathode, anode, and solid-state electrolyte to enhance the battery performance can all be attained by ALD. Therefore, the ALD technique has great potential to revolutionize the future of the battery industry. This review article provides a comprehensive foundation of the current state of ALD in synthesizing and developing LIB active components. Additionally, new trends and future expectations for the further development of next-generation LIBs via ALD are reported. Graphical Abstract

Scientists and tribologists are currently exploring sustainable and inexhaustible lubricants as a result of increased awareness of environmental and health-related issues. Vegetable oils are being investigated as a potential form of environmentally friendly cutting fluids due to their excellent renewability, biodegradability, and lubricating performance. This report provides an overview of different vegetable oils used as cutting fluids in the machining of engineering materials. The effects of virgin vegetable oils, emulsified vegetable-based oils, and vegetable-oil-based nano-cutting fluids on the cutting force, the surface finish of machined parts, the tool wear, and the temperature of the cutting area were surveyed critically. Compared to mineral-oil-based cutting fluids, studies have demonstrated that vegetable-oil-based cutting fluids meet cleaner manufacturing standards with good or better efficiency.

Atomic scale control of the thickness of thin film makes atomic layer deposition highly advantageous in the preparation of high quality super-lattices. However, precisely controlling the film chemical stoichiometry is very challenging. In this study, we deposited SiO_x film with different stoichiometry by plasma enhanced atomic layer deposition. After reviewing various deposition parameters like temperature, precursor pulse time, and gas flow, the silicon dioxides of stoichiometric (SiO₂) and non-stoichiometric (SiO_1.8 and SiO_1.6) were successfully fabricated. X-ray photo-electron spectroscopy was first employed to analyze the element content and chemical bonding energy of these films. Then the morphology, structure, composition, and optical characteristics of SiO_x film were systematically studied through atomic force microscope, transmission electron microscopy, X-ray reflection, and spectroscopic ellipsometry. The experimental results indicate that both the mass density and refractive index of SiO_1.8 and SiO_1.6 are less than SiO₂ film. The energy band-gap is approved by spectroscopic ellipsometry data and X-ray photo-electron spectroscopy O 1s analysis. The results demonstrate that the energy band-gap decreases as the oxygen concentration decreases in SiO_x film. After we obtained the Si-rich silicon oxide film deposition, the SiO_1.6/SiO₂ super-lattices was fabricated and its photoluminescence (PL) property was characterized by PL spectra. The weak PL intensity gives us greater awareness that more research is needed in order to decrease the x of SiO_x film to a larger extent through further optimizing plasma-enhanced atomic layer deposition processes, and hence improve the photoluminescence properties of SiO_x/SiO₂ super-lattices.