The modification mechanism of low-molecular-weight organic acids on a single-chain silicate mineral (wollastonite) was investigated through a leaching method. Solid and liquid samples were analyzed using atomic absorption spectrophotometer (AAS), X-ray diffraction (XRD), scanning electron microscope (SEM), and Fourier-transform infrared spectroscopy (FTIR). After 720 h of reaction, the results revealed that the dissolution concentration of Si (2200 μmol/L) in citric acid solution is more than that (1950 μmol/L) in oxalic acid. In the composite acids (citric acid and oxalic acid), the dissolution concentration of Si release from wollastonite reached the maximum value of 3304 μmol/L. The dissolution data of Si in wollastonite were fittingly described by the parabolic equation (Ct = a + bt^1/2), with the highest correlation coefficients (R² > 0.993), in the presence of the low-molecular-weight organic acids. The dissolution data suggested that the dissolution reaction process of Si was consistent with the diffusion-controlled model. Citric acid exhibited a higher affinity for attacking the (200) surface, while oxalic acid was prone to dissolve the (002) crystal face. The synergistic effects of oxalic acid and citric acid led to the weakening of the XRD diffraction peak intensity of wollastonite. When exposed to composite acids, the surface of wollastonite was covered with insoluble reactants that restricted the substance diffusion and hindered the reaction. This study offers valuable theoretical insights into the modification or activation of wollastonite by composite low-molecular-weight organic acids.

Feldspar is a high-abundance mineral in the earth’s crust, and its natural weathering and dissolution processes are an important phenomenon on the earth’s surface. This study focused on the dissolution behavior of silicon (Si) and aluminum (Al) in feldspar minerals (microcline and albite) when exposed to low-molecular-weight organic acids (LMWOAs). Various analytical techniques, including atomic absorption spectrophotometer, X-ray diffraction, scanning electron microscope, and Fourier-transform infrared spectroscopy, were employed to investigate these processes. The results revealed that the concentration of Si and Al released from alkali feldspar increased after treatment with LMWOAs, exhibiting non-stoichiometric dissolution. The Si/Al release ratio from feldspar deviated from the expected value of three. Among the LMWOAs tested, oxalic acid was found to be more effective in dissolving aluminum, while citric acid showed greater efficacy in dissolving silicon. Notably, the composite acid demonstrated the highest capacity for feldspar dissolution, with values of 538 μM (Si) and 287 µM (Al) after treatment for 720 h, respectively. The dissolution data for Si and Al in the organic acid solution was fittingly described by a first-order equation, with high correlation coefficients (R² ≥ 0.992). The characterization of feldspar powders indicated that the (040) crystal plane of feldspar was particularly susceptible to attack by organic acids. In the presence of these acids, the chemical bonds Si (Al)-O, Si-Si(Al), and O-Si(Al)-O shifted to higher wavenumbers. Additionally, the surface corrosion morphology of feldspar exhibited distinct nanostructures, which became more pronounced with increasing exposure time. It was also observed that the reactivity of feldspar increased over time. These findings provide valuable insights into the natural dissolution process of feldspar and offer a new perspective for the study of this phenomenon.