Optical polyimide (PI) membrane is a potential substrate to fabricate a diffractive primary lens in large aperture space-borne telescope. In this paper, we investigated the wet expansion behavior of PI via a strain gauge method and measured the coefficient of wet expansion (CWE) of PI membrane supported by different fixtures. The CWE of silica-fixed, ring-fixed, and free state PI membrane were near zero, 5 ppm/%, and 10 ppm/% respectively. It is found that Fresnel zone lens (FZL), based on PI membrane with lower CWE, achieve a better imaging quality with smaller wave-front errors. The underlying mechanisms and methods to improve imaging quality of ring-fixed FZL are discussed. This work provides direction in fabricating a flexible membrane diffractive lens with applicable imaging quality.

Optical polyimide (PI) membranes have been increasingly attractive in optoelectronic substrate and optical element material applications. Controlled stress distribution is very important to optical PI membrane-based optics. However, nondestructive absolute stress measurement inside optical PI membranes remains challenging. In this letter, we adopted the stress birefringence method to experimentally investigate the correlation between stress and retardation in uniaxially, biaxially, and circularly stretched PI membranes. The calculated value of the photoelastic coefficient was found to be around 400 nm/Mpa·cm. A theoretical model was established where the retardation angle is the negative arctan of the principal stress ratio in the biaxially stretched membrane. We also found that the average retardation angle is an important parameter for evaluating the uniformity of stretching force in the circularly stretched membrane. This work provides a better understanding of the stress birefringence measurement of membrane materials.

Optical polyimide (PI) membrane is a promising substrate material for diffractive lens applied in future large-aperture space based imaging system because of its light weight, environmental adaptability and deployable feature. In this letter, we put forward a facile large-area uniform photolithography technique using vacuum assisted self contact method to fabricate large-aperture membrane diffractive lens. We fabricated a φ 400 mm aperture membrane off-axis 2-levels Fresnel Zone Lens (FZL) based on the method and achieved uniformly distributed photoresist morphology as well as over 36.6% average diffraction efficiency in full aperture. The results demonstrated that vacuum assisted self contact method effectively eliminates considerable air gaps caused by unevenness of large area photomask and substrate, thus facilitates uniform light field distribution in photoresist. This work provides reference to fabrication techniques of large aperture membrane diffractive lens, and offers feasible methods for future large area flexible electronics manufacturing.

Reactive ion etching (RIE) is a promising material removal method for processing membrane diffractive optical elements and fabrication of meter-scale aperture optical substrates because of its high-efficiency parallel processing and low surface damage. However, the non-uniformity of the etching rate in the existing RIE technology will obviously reduce the machining accuracy of diffractive elements, deteriorate the diffraction efficiency and weaken the surface convergence rate of optical substrates. In the etching process of the polyimide (PI) membrane, additional electrodes were introduced for the first time to achieve the modulation of the plasma sheath properties on the same spatial surface, thus changing the etch rate distribution. Using the additional electrode, a periodic profile structure similar to the additional electrode was successfully processed on the surface of a 200-mm diameter PI membrane substrate by a single etching iteration. By combining etching experiments with plasma discharge simulations, it is demonstrated that additional electrodes can affect the material removal distribution, and the reasons for this are analyzed and discussed. This work demonstrates the feasibility of etching rate distribution modulation based on additional electrodes, and lays a foundation for realizing tailored material removal distribution and improving etching uniformity in the future.

In the process of plasma figure correction for a quartz sub-mirror, the plasma parallel removal process and ink masking layer are combined for the first time. A universal plasma figure correction method based on multiple distributed material removal functions is demonstrated, and its technological characteristics are analyzed. Through this method, the processing time is independent of the workpiece aperture, which saves time for the material removal function to scan along the trajectory. After seven iterations, the form error of the quartz element is converged from the initial figure error of ~114 nm RMS to a figure error of ~28 nm RMS, which shows the practical potential of the plasma figure correction method based on multiple distributed material removal functions in optical element manufacturing and the possibility of becoming a new stage process in the optical manufacturing chain.

The aperture of space telescopes increases with their required resolution, and the transmission optical systems with long focal length and diffractive primary lens are becoming increasingly popular. In space, the changes in the pose of the primary lens relative to the rear lens group have a significant impact on the imaging performance of the telescope system. The measurement of the pose of the primary lens in real-time and with high-precision is one of the important techniques for a space telescope. In this paper, a high-precision real-time pose measurement method for the primary lens of a space telescope in orbit based on laser ranging is proposed, and a verification system is established. The pose change of the telescope’s primary lens can be easily calculated through six high-precision laser distance changes. The measurement system can be installed freely, which solves the problems of complex system structure and low measurement accuracy in traditional pose measurement techniques. Analysis and experiments show that this method can accurately obtain the pose of the primary lens in real-time. The rotation error of the measurement system is 2 × 10⁻⁵ degrees (0.072 arcsecs), and the translation error is 0.2 μm. This study will provide a scientific basis for high-quality imaging of a space telescope.