Magnesium alloys have been investigated as temporary biomaterials for orthopedic applications. Despite their high osseointegration and mechanical (bone-like) properties, Mg alloys quickly degrade in simulated physiological media. Surface coatings can be deposited onto Mg alloys to slow the corrosion rate of these biomaterials in chloride-rich environments. TiO₂ films show high potential for improving the corrosion resistance of magnesium alloys. This article presents the structural observations and corrosion behavior of TiO₂ thin films deposited onto a MgCa2Zn1Gd3 alloy using atomic layer deposition (ALD). Surface morphologies were observed using scanning electron microscopy (SEM) and atomic force microscopy (AFM), and Raman analysis of the deposited TiO₂ films was also carried out. The corrosion behavior of the uncoated alloy and the alloy coated with TiO₂ was measured in Ringer’s solution at 37 °C using electrochemical and immersion tests. The microscopic observations of the TiO₂ thin films with a thickness of about 52.5 and 70 nm showed that the surface morphology was homogeneous without visible defects on the TiO₂ surface. The electrochemical and immersion test results showed that the thin films decreased the corrosion rate of the studied Mg-based alloy, and the corrosion resistance was higher in the thicker TiO₂ film.

One of the important research directions in the field of photovoltaics is integration with construction. The integration of solar cell systems with a building can reduce installation costs and help optimize the used space. Among the few literature reports on photovoltaic roof tiles, solutions with silicon and thin film solar cells dominate. An interesting solution may be the application of dye-sensitized solar cells. In addition to their interesting properties, they also have aesthetic value. In the classic arrangement, they are constructed using glass with a transparent conductive layer (TCL). This article describes replacing a classic glass counter electrode with an electrode based on a ceramic tile and nickel foil. First, a continuous and homogeneous fluorine-doped tin oxide (FTO) thin film was developed so that the above-mentioned substrate could be applied. The atomization method was used for this purpose. Then, nanocolloidal platinum paste was deposited as a catalytic material using the screen printing method. The electrical parameters of the manufactured DSSCs with and without a counter electrode tile were characterized by measuring their current–voltage characteristics under standard AM 1.5 radiation. A dye-sensitized solar cell integrated with ceramic tiles and nickel foil was produced and displayed an efficiency of over 4%. This solution makes it possible to expand their construction applications. The advantage of this solution is full integration with construction, while simultaneously generating electricity. A dye-sensitized solar cell was built layer-by-layer on a ceramic tile and nickel foil.

The paper presents the possibility of using Al₂O₃ antireflection coatings deposited by atomic layer deposition ALD. The ALD method is based on alternate pulsing of the precursor gases and vapors onto the substrate surface and then chemisorption or surface reaction of the precursors. The reactor is purged with an inert gas between the precursor pulses. The Al₂O₃ thin film in structure of the finished solar cells can play the role of both antireflection and passivation layer which will simplify the process. For this research 50×50 mm monocrystalline silicon solar cells with one bus bar have been used. The metallic contacts were prepared by screen printing method and Al₂O₃ antireflection coating by ALD method. Results and their analysis allow to conclude that the Al₂O₃ antireflection coating deposited by ALD has a significant impact on the optoelectronic properties of the silicon solar cell. For about 80 nm of Al₂O₃ the best results were obtained in the wavelength range of 400 to 800 nm reducing the reflection to less than 1%. The difference in the solar cells efficiency between with and without antireflection coating was 5.28%. The LBIC scan measurements may indicate a positive influence of the thin film Al₂O₃ on the bulk passivation of the silicon.