The primary driver for the development of organic thin-film transistors (TFTs) over the past few decades has been the prospect of electronics applications on unconventional substrates requiring low-temperature processing. A key requirement for many such applications is high-frequency switching or amplification at the low operating voltages provided by lithium-ion batteries (~3 V). To date, however, most organic-TFT technologies show limited dynamic performance unless high operating voltages are applied to mitigate high contact resistances and large parasitic capacitances. Here, we present flexible low-voltage organic TFTs with record static and dynamic performance, including contact resistance as small as 10 Ω·cm, on/off current ratios as large as 10¹⁰, subthreshold swing as small as 59 mV/decade, signal delays below 80 ns in inverters and ring oscillators, and transit frequencies as high as 21 MHz, all while using an inverted coplanar TFT structure that can be readily adapted to industry-standard lithographic techniques.

Despite the large body of research conducted on organic transistors, the transit frequency of organic field‐effect transistors has seen virtually no improvement for a decade and remains far below 1 GHz. One reason is that most of the research is still focused on improving the charge‐carrier mobility, a parameter that has little influence on the transit frequency of short‐channel transistors. By examining the fundamental equations for the transit frequency of field‐effect transistors and by extrapolating recent progress on the relevant device parameters, a roadmap to gigahertz organic transistors is derived.

Direct-write electron-beam lithography has been used to fabricate low-voltage p-channel and n-channel organic thin-film transistors with channel lengths as small as 200 nm and gate-to-contact overlaps as small as 100 nm on glass and on flexible transparent polymeric substrates. The p-channel transistors have on/off current ratios as large as 4 × 10⁹and subthreshold swings as small as 70 mV/decade, and the n-channel transistors have on/off ratios up to 10⁸and subthreshold swings as low as 80 mV/decade. These are the largest on/off current ratios reported to date for nanoscale organic transistors. Inverters based on two p-channel transistors with a channel length of 200 nm and gate-to-contact overlaps of 100 nm display characteristic switching-delay time constants between 80 and 40 ns at supply voltages between 1 and 2 V, corresponding to a supply voltage–normalized frequency of about 6 MHz/V. This is the highest voltage-normalized dynamic performance reported to date for organic transistors fabricated by maskless lithography.

One of the circuit topologies for the implementation of unipolar integrated circuits (circuits that use either p-channel or n-channel transistors, but not both) is the zero- V _GS architecture. Zero- V _GS circuits often provide excellent static performance (large small-signal gain and large noise margins), but they suffer from the large signal delay imposed by the load transistor. To address this limitation, we have used electron-beam lithography to fabricate zero- V _GS circuits based on organic transistors with channel lengths as small as 120 nm on flexible polymeric substrates. For a supply voltage of 3 V, these circuits have characteristic signal-delay time constants of 14 ns for the low-to-high transition and 560 ns for the high-to-low transition of the circuit’s output voltage. These signal delays represent the best dynamic performance reported to date for organic transistor–based zero- V _GS circuits. The signal-delay time constant of 14 ns is also the smallest signal delay reported to date for flexible organic transistors.

Organic thin‐film transistors are field‐effect transistors comprising a semiconductor in the form of a thin, typically polycrystalline layer of conjugated organic molecules. Since organic transistors can often be fabricated at temperatures no higher than about 100 °C, they are potentially useful for flexible, large‐area electronics applications. An important performance parameter of organic transistors is the transit frequency, which is the highest frequency at which the transistors can be operated. The transit frequency of organic transistors is determined in large part by the channel length and the parasitic gate‐to‐source and gate‐to‐drain overlap lengths. How small these dimensions can be made depends (at least in the case of transistors fabricated in the lateral device architecture) greatly on the resolution of the lithography method that is utilized for the patterning of the gate electrodes and the source and drain contacts. Patterning methods that have yielded organic transistors with lateral dimensions sufficiently small to provide transit frequencies above 10 MHz include photolithography, laser lithography, stencil lithography, and electron‐beam lithography. In this review, these four lithography methods and their roles in the fabrication of high‐frequency organic transistors, as well as their prospects for future improvements in the dynamic performance of organic transistors, will be illuminated.