Aleksandr Viktorovich Saenko

Prof. Aleksandr Viktorovich Saenko

Institute of Nanotechnologies, Southern Federal University, Rostov-on-Don, Russia
orcid

Research Focus & Metrics

Academic Career Length

14Years (2013-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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28 January 2022 in Nanomaterials
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Journal Article
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RTRoman Viktorovich Tominov
Roman Viktorovich Tominov
ZVZakhar E. Vakulov
Zakhar E. Vakulov
NPNikita V. Polupanov
Nikita V. Polupanov
ASAleksandr Viktorovich Saenko
Aleksandr Viktorovich Saenko
VAVadim Avilov
Vadim Avilov
Vladimir SmirnovVladimir Smirnov
Vladimir Smirnov
This article presents the results of experimental studies of the impact of electrode material and the effect of nanoscale film thickness on the resistive switching in forming-free nanocrystalline ZnO films grown by pulsed laser deposition. It was demonstrated that the nanocrystalline ZnO film with TiN, Pt, ZnO:In, and ZnO:Pd bottom electrodes exhibits a nonlinear bipolar effect of forming-free resistive switching. The sample with Pt showed the highest resistance values RHRS and RLRS and the highest value of Uset = 2.7 ± 0.4 V. The samples with the ZnO:In and ZnO:Pd bottom electrode showed the lowest Uset and Ures values. An increase in the number of laser pulses from 1000 to 5000 was shown to lead to an increase in the thickness of the nanocrystalline ZnO film from 7.2 ± 2.5 nm to 53.6 ± 18.3 nm. The dependence of electrophysical parameters (electron concentration, electron mobility, and resistivity) on the thickness of the forming-free nanocrystalline ZnO film for the TiN/ZnO/W structure was investigated. The endurance test and homogeneity test for TiN/ZnO/W structures were performed. The structure Al2O3/TiN/ZnO/W with a nanocrystalline ZnO thickness 41.2 ± 9.7 nm was shown to be preferable for the manufacture of ReRAM and memristive neuromorphic systems due to the highest value of RHRS/RLRS = 2307.8 ± 166.4 and low values of Uset = 1.9 ± 0.2 V and Ures = −1.3 ± 0.5 V. It was demonstrated that the use of the TiN top electrode in the Al2O3/TiN/ZnO memristor structure allowed for the reduction in Uset and Ures and the increase in the RHRS/RLRS ratio. The results obtained can be used in the manufacturing of resistive-switching nanoscale devices for neuromorphic computing based on the forming-free nanocrystalline ZnO oxide films.

1 October 2016 in IOP Conference Series: Materials Science and Engineering
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SMS P Malyukov
S P Malyukov
ASAleksandr Viktorovich Saenko
Aleksandr Viktorovich Saenko
AIA V Ivanova
A V Ivanova
The paper is devoted to the research and development of high-efficiency solar cells with a planar perovskite n-i-p structure. A numerical model of this solar cell in the driftdiffusion approximation based on Poisson equation and continuity equations provided to determine their photoelectric characteristics and design optimization. The author considers the spectral photogeneration, bulk and surface recombination, transport charge carriers in perovskite and their collection by the electron and hole transport layers. As a result of the simulation, it was obtained efficiency dependence on perovskite absorber material thickness and lifetime (diffusion length) of the charge carriers. It is found that in addition to absorption coefficient optimal perovskite thickness is determined largely by the charge carrier diffusion length, and it has the upper limit in thickness of 500-600 nm.

27 November 2024 in Nanomaterials
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ASAleksandr Viktorovich Saenko
Aleksandr Viktorovich Saenko
RTRoman Viktorovich Tominov
Roman Viktorovich Tominov
Igor JityaevIgor Jityaev
Igor Jityaev
ZVZakhar E. Vakulov
Zakhar E. Vakulov
VAVadim Avilov
Vadim Avilov
Vladimir SmirnovVladimir Smirnov
Vladimir Smirnov
This paper presents the results of experimental studies of the influence of high-frequency magnetron sputtering power on the structural and electrophysical properties of nanocrystalline ZnO films. It is shown that at a magnetron sputtering power of 75 W in an argon atmosphere at room temperature, ZnO films have a relatively smooth surface and a uniform nanocrystalline structure. Based on the results obtained, the formation and study of resistive switching of transparent ITO/ZnO/ITO memristor structures as well as a crossbar array based on them were performed. It is demonstrated that memristor structures based on ZnO films obtained at a magnetron sputtering power of 75 W exhibit stable resistive switching for 1000 cycles between high resistance states (HRS = 537.4 ± 26.7 Ω) and low resistance states (LRS = 291.4 ± 38.5 Ω), while the resistance ratio in HRS/LRS is ~1.8. On the basis of the experimental findings, we carried out mathematical modeling of the resistive switching of this structure, and it demonstrated that the regions with an increase in the electric field strength along the edge of the upper electrode become the main sources of oxygen vacancy generation in ZnO film. A crossbar array of 16 transparent ITO/ZnO/ITO memristor structures was also fabricated, demonstrating 20,000 resistive switching cycles between LRS = 13.8 ± 1.4 kΩ and HRS = 34.8 ± 2.6 kΩ for all devices, with a resistance ratio of HRS/LRS of ~2.5. The obtained results can be used in the development of technological processes for the manufacturing of transparent memristor crossbars for neuromorphic structures of machine vision, robotics, and artificial intelligence systems.

1 April 2018 in Technical Physics Letters
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NCN. N. Chernov
N. N. Chernov
APA. V. Palii
A. V. Palii
ASAleksandr Viktorovich Saenko
Aleksandr Viktorovich Saenko
AMA. M. Maevskii
A. M. Maevskii
Aerodynamic flow past bodies of various geometrical shapes was studied, and the aerodynamic drag force was reduced through optimization of the body shape using a specially proposed method. The...

24 November 2013 in Journal of Russian Laser Research
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SMS. P. Malyukov
S. P. Malyukov
ASAleksandr Viktorovich Saenko
Aleksandr Viktorovich Saenko

16 September 2016 in Semiconductors
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SMS. P. Malyukov
S. P. Malyukov
ASAleksandr Viktorovich Saenko
Aleksandr Viktorovich Saenko
IKI. A. Kirichenko
I. A. Kirichenko