While silicon has been a steadfast semiconductor material for the past 50 years, it is now facing competition from other materials, especially for detector design. In that respect, due to its high resistance to radiation damage, silicon carbide is one of the most promising materials. In this work, we discuss the radiation damage studies of a new, large area, p-n junction silicon carbide device developed by the SiCILIA collaboration. We have studied the general performances of several devices, as a function of fluence, irradiated in different experimental conditions with different beams. A standard p-n junction silicon detector was also irradiated for comparison. The new detectors manifest excellent performance in terms of stability of the main parameters, linearity, defect distribution, charge collection efficiency, energy resolution, leakage current, etc. Experimental results evidence a radiation resistance of SiC devices more than two order of magnitude higher than Si devices. The new construction technology applied to silicon carbide material has made it possible to create very robust devices with excellent performance. These devices will soon be available for all those scientific projects where a high resistance to radiation damage is required.

In this paper, we present the status of the line for laser-driven light ions acceleration (L3IA) currently under implementation at the Intense Laser Irradiation Laboratory (ILIL), and we provide an overview of the pilot experimental activity on laser-driven ion acceleration carried out in support of the design of the line. A description of the main components is given, including the laser, the beam transport line, the interaction chamber, and the diagnostics. A review of the main results obtained so far during the pilot experimental activity is also reported, including details of the laser-plasma interaction and ion beam characterization. A brief description of the preliminary results of a dedicated numerical modeling is also provided.

The purpose of this work is to study the 4H-SiC epitaxial layer properties for the fabrication of a device for neutron detection as an alternative material to diamond detectors used in this field. We have studied a high growth rate process to grow a thick epitaxial layer (250 µm) of 4H-SiC and, in order to estimate the quality of the epitaxial layer, an optical characterization was done through Photoluminescence (PL) spectroscopy for stacking fault defect evaluation. Micro Raman spectroscopy was used for simultaneous determination of both carrier lifetime and induced carriers in equilibrium. We have compared these results with other two samples with an epitaxial layer of 100 micron, obtained with two different growth rates, 60 and 90 µm/h, respectively. From Raman measurements it has been observed that both the growth rate and the grown epitaxial layer thickness have an effect on the measured carrier lifetime. A comparison between different kinds of stacking faults (SF) was done, evaluating the influence of these defects on the carrier lifetime as a function of the injection level and it was observed that only at a low injection is the effect on the carrier lifetime low.

The NUMEN (NUclear Matrix Elements for Neutrinoless double beta decay) project was recently proposed with the aim to investigate the nuclear response to Double Charge Exchange reactions for all the isotopes explored by present and future studies of 0νββ decay. The expected level of radiation in the NUMEN experiment imposes severe limitations on the average lifetime of the electronic devices. During the experiments, it is expected that the electronic devices will be exposed to about 10⁵ neutrons/cm²/s according to FLUKA simulations. This paper investigates the reliability of a System On Module (SOM) under neutron radiation. The tests were performed using thermal, epithermal, and fast neutrons produced by the Instituto de Pesquisas Energéticas e Nucleares 4.5 MW Nuclear Research Reactor. The results show that the National Instruments SOM is robust to neutron radiation for the proposed applications in the NUMEN project.

The aim of this work was a deep spectroscopical characterization of a thick 4H SiC epitaxial layer and a comparison of results between samples before and after a thermal oxidation process carried out at 1400 °C for 48 h. Through Raman and photoluminescence (PL) spectroscopies, the carrier lifetimes and the general status of the epilayer were evaluated. Time-resolved photoluminescence (TRPL) was used to estimate carrier lifetime over the entire 250 µm epilayer using different wavelengths to obtain information from different depths. Furthermore, an analysis of stacking fault defects was conducted through PL and Raman maps to evaluate how these defects could affect the carrier lifetime, in particular after the thermal oxidation process, in comparison with non-oxidated samples. This study shows that the oxidation process allows an improvement in the epitaxial layer performances in terms of carrier lifetime and diffusion length. These results were confirmed using deep level transient spectroscopy (DLTS) measurements evidencing a decrease in the Z_1/2 centers, although the oxidation generated other types of defects, ON1 and ON2, which appeared to affect the carrier lifetime less than Z_1/2 centers.

The objective of the proposed work was to investigate the electrical performance of a 250 µm-thick 4H-SiC p-n junction detector after irradiation with DT neutrons (14.1 MeV energy) at high temperature (500 °C). The results showed that the current–voltage (I-V) characteristics of the unirradiated SiC detector were ideal, with an ideality factor close to 1.5. A high electron mobility (µ_n) and built-in voltage (V_bi) were also observed. Additionally, the leakage current remained very low in the temperature range of 298–523 K. High-temperature irradiation caused a deviation from ideal behaviour, leading to an increase in the ideality factor, decreases in the µ_n and V_bi values, and a significant rise in the leakage current. Studying the capacitance–voltage (C-V) characteristics, it was observed that neutron irradiation induced reductions in both Al-doped (p⁺-type) and N-doped (n⁻-type) 4H-SiC carrier concentrations. A comprehensive investigation of the deep defect states and impurities was carried out using deep-level transient spectroscopy (DLTS) in the temperature range of 85–750 K. In particular, high-temperature neutron irradiation influenced the behaviours of both the Z_1/2 and EH_6/7 traps, which were related to carbon interstitials, silicon vacancies, or anti-site pairs.