Multilayer films with high-density layer interfaces have been studied widely because of the unique mechanical and functional properties. Magnetron sputtering is widely chosen to fabricate multilayer films because of the convenience in controlling the microstructure. Essentially, the properties of multilayer films are decided by the microstructure, which could be adjusted by manipulating the deposition parameters, such as deposition temperature, rate, bias, and target–substrate distance, during the sputter process. In this review, the influences of the deposition parameters on the microstructure evolution of the multilayer films have been summarized. Additionally, the impacts of individual layer thickness on the microstructure evolution as well as the irradiation behavior of various multilayer films have been discussed.

Atomic oxygen in the low Earth orbit (LEO) environment is highly oxidizing. Due to the high flight speed of spacecraft, the relative kinetic energy of high-flux atomic oxygen bombarding the spacecraft surface can reach up to about 5 eV. Therefore, atomic oxygen is one of the most dangerous space environment factors in LEO, which seriously affects the safe operation and service life of spacecraft in orbit. In order to meet the requirements for the high reliability and long lifetime of spacecraft, effective protection measures must be taken on their sensitive surfaces. Siloxane is a coating with an organic–inorganic hybrid structure. Compared with SiO₂ and other inorganic atomic oxygen protective coatings, it has better flexibility and is better at anti-atomic oxygen performance. In this paper, the plasma polymerization deposition technique was used to prepare large-area siloxane coatings on different substrates with different thicknesses for improving atomic oxygen resistance by optimizing the process parameters. The thickness of the coating was measured by different methods, and the results showed that the thickness distribution was consistent. By observing the surface morphology of the coating, it was uniform and compact without obvious defects, so the uniformity of large-area coating was also ideal. The adhesion and heat/humidity resistance of siloxane coatings were examined by pull-off testing and damp-heat testing, respectively. The results showed that the siloxane coatings with a thickness of about 400 nm exhibited better physical properties. At the same time, the ground simulation testing of atomic oxygen confirmed that siloxane coatings with a thickness of 418 nm presented the best performance of atomic oxygen resistance. The atomic oxygen erosion yield of siloxane coatings with a thickness of 418 nm was as low as 5.39 × 10⁻²⁷ cm³/atoms, which was three orders of magnitude lower than that of the uncoated Kapton substrate and presented a good anti-atomic oxygen performance. Meanwhile, it has also successfully passed the damp-heat test. The coating thickness is only several hundred nanometers and does not increase the weight of the spacecraft, which makes it a relatively ideal LEO atomic oxygen protection material. Furthermore, a possible mechanism was proposed to explicate the physicochemical process of atomic oxygen attacking the coating materials.