In this study, a novel finishing method, entitled clustered magnetorheological finish (CMRF), was proposed to improve surface finish of the silicon nitride ( ${\mathrm{Si}}_3{\mathrm{N}}_4$ ) balls with ultra fine precision. The effects of different polishing parameters including rotation speeds, eccentricities and the machining gaps on surface finish of ${\mathrm{Si}}_3{\mathrm{N}}_4$ balls were investigated by analyzing the roughness, sphericity and the micro morphology of the machined surface. The experimental results showed that the polishing parameters significantly influenced the surface finish. The best surface finish was obtained by using the polishing parameters: the machining gap of 0.8 mm, the eccentricity of 10 mm and the rotation ratio of 3/4. To further investigate the influence of the polishing parameters on the surface finish, an analytical model was also developed to analyze the kinematics of the ceramic ball during CMRF process. The resulting surface finish, as a function of different polishing parameters employed, was evaluated by analyzing the visualized finishing trace and the distribution of the contact points. The simulative results showed that the distribution and trace of the contact points changed with different polishing parameters, which was in accordance with the results of experiments.

TiAlSiN and AlCrN coatings are two representative coatings with excellent properties in TiN-based and CrN-based coatings, respectively. Multilayering is one of the most important directions for coating performance optimization. In this paper, nanoscale monolayer TiAlSiN, AlCrN, and multilayer TiAlSiN/AlCrN coatings were prepared. The microstructure, mechanical properties, oxidation resistance, and wear resistance of the above three coatings were investigated. The following properties of the TiAlSiN/AlCrN coating, including phase, nanohardness, elastic modulus, adhesion strength, and oxidation resistance, fall between those of the TiAlSiN and AlCrN coatings and conform to the “law of mixtures”. Due to the interfacial effect of the multilayer coating, the residual stress of the TiAlSiN/AlCrN coating is less than that of the two monolayer coatings. At 500 °C, the order of wear resistance of the three coatings is consistent with the order of H³/E*² values, i.e., TiAlSiN > TiAlSiN/AlCrN > AlCrN; at 800 °C, the order of wear resistance becomes TiAlSiN/AlCrN > TiAlSiN > AlCrN because TiAlSiN coating has entered the rapid oxidization stage first, reducing its wear resistance.

Cu/Diamond (Cu/Dia) composites are regarded as next-generation thermal dissipation materials and hold tremendous potential for use in future high-power electronic devices. The interface structure between the Cu matrix and the diamond has a significant impact on the thermophysical properties of the composite materials. In this study, Cu/Dia composite materials were fabricated using the Spark Plasma Sintering (SPS) process. The results indicate that the agglomeration of diamond particles decreases with increasing particle size and that a uniform distribution is achieved at 200 μm. With an increase in the sintering temperature, the interface bonding is first optimized and then weakened, with the optimal sintering temperature being 900 °C. The addition of Cr to the Cu matrix leads to the formation of Cr₇C₃ after sintering, which enhances the relative density and bonding strength at the interface, transitioning it from a physical bond to a metallurgical bond. Optimizing the diamond particle size increased the thermal conductivity from 310 W/m K to 386 W/m K, while further optimizing the interface led to a significant increase to 516 W/m K, representing an overall improvement of approximately 66%.

Hydrogenated amorphous carbon (a-C:H) films are widely valued for their excellent mechanical strength and low friction, but their performance significantly degrades at elevated temperatures, limiting practical applications in aerospace environments. In this work, we aimed to enhance the high-temperature tribological behavior of a-C:H films through controlled silicon (Si) doping. A series of a-C:H:Si films with varying Si contents were fabricated via direct current magnetron sputtering, and their microstructure, mechanical properties, and friction behavior were systematically evaluated from room temperature up to 400 °C. Results show that moderate Si doping (8.3 at.%) substantially enhances hardness and wear resistance, while enabling ultralow friction (as low as 0.0034) at 400 °C. This superior performance is attributed to the synergistic effects of transfer layer formation, preferential Si oxidation, and tribo-induced graphitization. This study provides new insights into the high-temperature lubrication mechanisms of Si-doped a-C:H films and demonstrates the critical role of Si content optimization, highlighting a viable strategy for extending the thermal stability and lifespan of solid-lubricating films.