We report on optically pumped lasing at 500 nm on InGaN laser structures grown by plasma assisted molecular beam epitaxy. The InGaN laser structures were grown under group III-rich conditions on bulk (0001) GaN substrates. The influence of the nitrogen flux and growth temperature on the indium content of InGaN layers was studied. We demonstrate that at elevated growth temperatures, where appreciable dissociation rate for In-N bonds is observed, the indium content of InGaN layers increases with increasing nitrogen flux. We show that growth of InGaN at higher temperatures improves optical quality of InGaN quantum wells, which is crucial for green emitters. The influence of piezoelectric fields on the lasing wavelength is also discussed. In particular, the controversial issue of partial versus complete screening of built-in electric field at lasing conditions is examined, supporting the former case.

Unlike non-polar semiconductors such as silicon, the broken inversion symmetry of the wide-bandgap semiconductor gallium nitride (GaN) leads to a large electronic polarization along a unique crystal axis¹. This makes the two surfaces of the semiconductor wafer perpendicular to the polar axis substantially different in their physical and chemical properties². In the past three decades, the cation (gallium) face of GaN has been used for photonic devices such as light-emitting diodes (LEDs) and lasers^3,4,5. Although the cation face has also been predominantly used for electronic devices, the anion (nitrogen) face has recently shown promise for high-electron-mobility transistors (HEMTs) owing to favourable polarization discontinuities⁶. In this work, we introduce dualtronics, showing that it is possible to make photonic devices on the cation face and electronic devices on the anion face of the same semiconductor wafer. This opens the possibility for making use of both faces of polar semiconductors in a single structure, in which electronic, photonic and acoustic properties can be implemented on opposite faces of the same wafer, markedly enhancing the functional capabilities of this revolutionary semiconductor family.

We demonstrate true-blue 450 nm tunnel junction (TJ) laser diodes (LDs) grown by plasma-assisted molecular beam epitaxy (PAMBE). The absence of hydrogen during PAMBE growth allows us to achieve TJs with low resistance. We compare TJ LDs with LDs of standard construction with p-type metal contact. For both types of LD, the threshold current density is around 3 kA/cm² and the slope efficiency is 0.5 W/A. We do not observe any significant changes in optical losses and differential gain in TJ LDs compared with standard LDs. The differential resistivity of the TJs for current densities higher than 2 kA/cm² is below 10⁻⁴ Ωcm².