Optimization of metal-based transparent conductors (MTCs) made of silver and aluminium-doped zinc oxide (AZO) prepared by radio-frequency (r.f.) sputtering has been carried out through tuning of metal film properties. The influence of morphology and related plasmonic features of AZO/Ag/AZO MTCs on their optical and electrical performance is demonstrated and it is shown that the nominal thickness of the silver layer itself is not the most crucial value determining the MTC performance. The MTC performance has been optimized by a search of deposition conditions ensuring fractal-type metal layer formation up to a certain coalescence state that enables full gaining from silver optical properties, including its plasmonic features. For 150 W- and 200 W-deposited silver, MTCs with maximum transmittance as high as 83.6% have been obtained. These coatings have a figure of merit as good as 0.01 Ω⁻¹ and a remarkably wide spectral transparency region: transmittance higher than 70% down to 1200 nm for 200W-samples. Modelling of the MTC coatings is proposed additionally, based on variable angle spectroscopic ellipsometric measurements, which takes into account the variation of the optical properties of silver when deposited in various conditions and embedded in a semiconductor stack.

In this paper, a surface plasmon resonance (SPR) spectroscopic ellipsometry, based on Otto-Bliokh configuration, is developed for the measurement of thickness and optical constants of ultra-thin coatings. This technique combines sensitivity of surface plasmon with accessibility of optical constants and other advantages of ellipsometry. Surface plasmons (SP) are generated in the sample under test in total reflectance mode and SP geometric distribution over the sample surface is influenced by the coating thickness and optical properties on one hand, and by the air gap thickness on the other hand. Nanoscale control of the thickness of the air gap between a convex surface and the sample was assured using a micron-size beam spot irradiating the contact zone. The amplitude and phase change induced by SPR in the visible and near-infrared spectral range were obtained to determine the dispersion of optical constants and the thickness of the ultra-thin layer. The extracted optical constants were found to be in excellent agreement with the results obtained using TEM and XRR techniques. Both theoretical analysis and experimental results demonstrated high sensitivity and precision of the proposed technique for the analysis of coatings of both metals and dielectrics on metals.

We report a systematic nanoscale investigation on the ultrathin Cr film growth process and properties. Polycrystalline metallic films were manufactured by magnetron sputtering on fused silica substrates. The film growth was observed in situ by broad-band optical monitoring (BBM) and plasma-emission spectroscopy (OES) methods. The ex situ characterization of the Cr films with thicknesses varying from 2.6 nm up to 57 nm were performed by both non-destructive and destructive techniques. Recently, we reported on a novel set of data for optical and electrical properties of sputtered chromium films. The optical and electrical properties of the films are known to be governed by their structure and microstructure, which were analyzed in detail in the present research. Moreover, the optical properties of the films were studied here in a significantly wider optical range and obtained using both in situ and ex situ measurements. Reliable in situ nanoscale characterization of metal films was shown to ensure an unfailing approach in obtaining ultrathin layers with desirable thickness and stable and well-determined optical constants and electrical conductivity. This is of high importance for various industries and novel upcoming applications.

The sensitivity of an induced transmission filter (ITF) design to deposition errors is analyzed for the case of a single metal layer ITF. Theoretical knowledge of the least and most sensitive layers within the ITF design improves deposition reliability when using broadband optical monitoring of only the dielectric part of such metal–dielectric filters. Linearly variable ITFs have been successfully fabricated using this developed approach for error compensation.