The II-IV semiconductor compound, CdTe, has suitable electrical and optical properties as photovoltaic and high-energy radiation sensor material. As an absorber material for thin-film-based solar cells, CdTe holds the potentiality to fabricate high-efficiency solar cells by means of low-cost technologies. This chapter presents a comprehensive review on the CdTe thin-film deposition techniques as well as on the several configurations for the solar cell structures that have led the best efficiency conversion. Current CdTe thin-film deposition techniques include sputtering, close spaced vapor transport (CSVT), chemical spray pyrolysis, and electrodeposition. These techniques have easily been adapted to deposit polycrystalline CdTe films on various flexible and rigid substrates. In regard to the device structure configuration, a variety of partner materials (transparent contact, optical window, buffer layer) were tested, and CdTe film thickness was varied to develop opaque and semitransparent devices by some techniques mentioned above. In this chapter, we will discuss about each technique used for CdTe thin-film deposition as well as its advantages and disadvantages.
In this work, we present a theoretical study on the use of Cu2ZnSn(S,Se)4 quantum wells in Cu2ZnSnS4 solar cells to enhance device efficiency. The role of different well thickness, number, and S/(S + Se) composition values is evaluated. The physical mechanisms governing the optoelectronic parameters are analyzed. The behavior of solar cells based on Cu2ZnSn(S,Se)4 without quantum wells is also considered for comparison. Cu2ZnSn(S,Se)4 quantum wells with a thickness lower than 50 nm present the formation of discretized eigenstates which play a fundamental role in absorption and recombination processes. Results show that well thickness plays a more important role than well number. We found that the use of wells with thicknesses higher than 20 nm allow for better efficiencies than those obtained for a device without nanostructures. A record efficiency of 37.5% is achieved when 36 wells with a width of 50 nm are used, considering an S/(S + Se) well compositional ratio of 0.25.