Ammonothermal GaN samples with the concentration of free electrons of 1018 and 1019 cm−3 were annealed in a wide range of temperatures (Tann = 300–1400 °C) under atmospheric N2 pressure and under ultra-high N2 pressure conditions to avoid the GaN decomposition. Photoluminescence (PL) studies reveal the YL2 band with a maximum at 2.3 eV before annealing and two new PL bands after annealing at Tann > 600 °C: the OL3 band with a maximum at 2.1 eV and the RL4 band with a maximum at 1.6–1.7 eV. The ammonothermal GaN samples have high concentrations of complexes containing gallium vacancy (VGa), hydrogen, and oxygen. The first-principles calculations suggest that the VGa-3Hi complex is the origin of the YL2 band, while the VGa-3ON complex is responsible for the RL4 band.
Electrical properties of carbon-doped halide vapor phase epitaxy-GaN are presented and discussed. Crystals of the highest structural quality and with different carbon concentrations are investigated. Resistivity and Hall measurements as a function of temperature are analyzed in detail. It is found that the concentration of free holes systematically decreases with the increase of carbon concentration. Such behavior results from the fact that the compensation of the carbon acceptor level increases with the carbon concentration. It is accepted that carbon is amphoteric impurity in GaN, creating an acceptor as well as a donor state, which leads to self-compensation. The analysis of existing electron paramagnetic resonance results is extremely important. It enabled us to determine the compensation ratio as a function of carbon concentration. A combination of electron paramagnetic resonance, secondary ion mass spectrometry, and Hall data allowed us to conclude that the acceptor level (CN) exhibits rather significant temperature shift equal to 0.35 meV/K.
8 April 2022 in Semiconductor Science and Technology
This paper presents a comparative study of electron transport phenomena in n-type gallium nitride strongly doped, above the Mott transition, with silicon and germanium. The samples under study were grown by molecular beam epitaxy, metal-organic vapor phase epitaxy and halide vapor phase epitaxy. The temperature dependence of resistivity and Hall Effect was investigated at temperatures ranging from 10 K up to 650 K. The measurements at sub-room temperatures allow the study of scattering mechanisms related to extrinsic material properties. The observed temperature dependences of the electrical transport properties were analyzed in the frame of the model taking into account a typical scattering mechanism and degree of degeneracy of free carrier electron gas. The limitations of the applied models will be presented.
Photoluminescence (PL) from GaN substrates fabricated by the ammonothermal growth method was studied in a wide range of temperatures and excitation intensities, both with steady-state and time-resolved PL techniques. Three defect-related PL bands were detected: the ultraviolet luminescence band with the zero-phonon line at 3.27 eV, the Zn-related BL1 band with a maximum at 2.9 eV, and the yellow luminescence band (labeled YL2) with a maximum at 2.3 eV. The YL2 band belongs to an unknown defect and is different from the CN-related YL1 band. Its maximum blueshifts by 0.06 eV with increasing excitation intensity and redshifts by more than 0.1 eV with a time delay after a laser pulse. The YL2 band is preliminarily attributed to a defect complex containing the gallium vacancy.
Co-doping with manganese and carbon was performed in gallium nitride grown by halide vapor phase epitaxy method. Native seeds of high structural quality were used. The crystallized material was examined in terms of its structural, optical, and electrical properties. For that purpose, different characterization methods: x-ray diffraction, Raman spectroscopy, low-temperature photoluminescence, and temperature-dependent Hall effect measurements, were applied. The physical properties of the co-doped samples were compared with the properties of crystals grown in the same reactor, on similar seeds, but doped only with manganese or carbon. A comparison of the electrical and optical properties allowed to determine the role of manganese and carbon in doped and co-doped gallium nitride crystals.
Zinc is often regarded as an alternative to magnesium p-type dopants in gallium nitride. However, besides many theoretical predictions, at present, there are poor data on experimentally revealed p-type conductivity and evaluation of Zn activation energy by means of electrical transport measurements. In this paper, ammonothermal crystallization of bulk GaN:Zn monocrystals is reported. Despite a high doping level of Zn (up to 2 × 1020 cm−3), p-type conductivity with hole concentration as low as of 4 × 1015 cm−3 at room temperature and mobility about 3 cm2/V s was observed. A deep nature of the Zn acceptor was proved, as the ionization energy can exceed 260 meV. In addition, conduction in the impurity band appeared at temperatures as high as room temperature.