The generation of large spin currents, and the associated spin torques, which are at the heart of modern spintronics, has long been achieved by charge-to-spin conversion mechanisms, i.e., the spin Hall effect and/or the Rashba–Edelstein effect, intrinsically linked to strong spin–orbit coupling. Recently, a novel path has been predicted and observed for achieving significant current-induced torques originating from light elements, hence possessing weak spin–orbit interaction. These findings point out to the potential involvement of the orbital counterpart of electrons, namely the orbital Hall and orbital Rashba–Edelstein effects. In this study, we aim at quantifying these orbital-related contributions to the effective torques acting on a thin Co layer in different systems. First, we demonstrate in Pt|Co|Cu|AlOx stacking a comparable torque strength coming from the conversion due to the orbital Rashba–Edelstein effect at the Cu|AlOx interface and the one from the effective spin Hall effect in the bottom Pt|Co system. Second, in order to amplify the orbital-to-spin conversion, we investigate the impact of an intermediate Pt layer in Co|Pt|Cu|CuOx. From the Pt thickness dependence of the effective torques determined by harmonic Hall measurements complemented by spin Hall magneto-resistance and THz spectroscopy experiments, we demonstrate that a large orbital Rashba–Edelstein effect is present at the Cu|CuOx interface, leading to a twofold enhancement of the net torques on Co for the optimal Pt thickness. Our findings not only demonstrate the crucial role that orbital currents can play in low-dimensional systems with weak spin–orbit coupling but also reveal that they enable more energy efficient manipulation of magnetization in spintronic devices.
Understanding the competing modes of brittle versus ductile fracture is critical for preventing the failure of body-centered cubic (BCC) refractory metals. Despite decades of intensive investigations, the nanoscale fracture processes and associated atomistic mechanisms in BCC metals remain elusive due to insufficient atomic-scale experimental evidence. Here, we perform in situ atomic-resolution observations of nanoscale fracture in single crystals of BCC Mo. The crack growth process involves the nucleation, motion, and interaction of dislocations on multiple 1/2 < 111 > {110} slip systems at the crack tip. These dislocation activities give rise to an alternating sequence of crack-tip plastic shearing, resulting in crack blunting, and local separation normal to the crack plane, leading to crack extension and sharpening. Atomistic simulations reveal the effects of temperature and strain rate on these alternating processes of crack growth, providing insights into the dislocation-mediated mechanisms of the ductile to brittle transition in BCC refractory metals.
In this study, the deformation mechanisms of bent Si nanowires are investigated at the atomic scale with bending strain up to 12.8%. The sign and magnitude of the applied strain are found to govern their deformation mechanisms, in which the dislocation types (full or partial dislocations) can be affected by the sign (tensile or compressive) and magnitude of the applied strain. In the early stages of bending, plastic deformation is controlled by 60° full dislocations. As the bending increases, Lomer dislocations can be frequently observed. When the strain increases to a significant level, 90° partial dislocations induced from the tensile surfaces of the bent nanowires are observed. This study provides a deeper understanding of the effect of the sign and magnitude of the bending strain on the deformation mechanisms in bent Si nanowires.
We present a methodology to quantify polarization and electron affinity changes at interfaces by combining scanning tunneling spectroscopy, off-axis electron holography in transmission electron microscopy (TEM), and self-consistent calculations of the electrostatic potential and electron phase change. We use a precisely known grown-in doping structure to calibrate the surface potential of the TEM lamella and thereby achieve a quantitative analysis of electron phase changes measured by off-axis electron holography. Using this calibration, we deduce quantitatively polarization and electron affinity changes for and interfaces. The latter interface reveals, as expected, biaxial relaxation as well as polarization and electron affinity changes. However, at the interface anomalous lattice relaxations and vanishing polarization and electron affinity changes occur, whose underlying physical origin is anticipated to be total energy minimization by the minimization of Coulomb interactions between the polarization-induced interface charges.
The study investigates the microstructure evolution in the stir zone produced by the friction stir processing (FSP) of a heat-treated microalloyed Al-Mn-Cu alloy in the area subjected to the highest temperature, strain, and strain rate. The samples were studied using electron microscopy and atom probe tomography (APT) to obtain structural and chemical information from the macro to the nano scale. FSP refines the dendritic Al-rich solid solution grains through dynamic recrystallisation in the range of a few micrometres. The primary intermetallic phases were dispersed to the particles in the 0.5–3 µm range and transformed mainly into a more stable τ1-Al29Mn6Cu4 phase. The fraction of dispersed particles after FSP increased due to the precipitation from the solid solution during cooling. The nanoscale quasicrystalline precipitates in the matrix, formed upon heat treatment, dissolved entirely during FSP, while the strong coarsening of the L12 precipitates occurred due to high temperatures in the stir zone. After FSP, the hardness of the stir zone was nearly identical for specimens in the as-cast and heat-treated conditions.
The knowledge of the band alignment in semiconductor heterostructures is crucial, as it governs carrier confinement with many impacts on the performances of devices. By controlling the direction of the current flow in in-plane In0.53Ga0.47As/InP heterostructure nanowires, either horizontally along the nanowires or vertically into the InP substrate with low temperature multiple-probe tunneling spectroscopy, a direct measurement of the band offsets at the buried In0.53Ga0.47As/InP heterointerface is performed. Despite the unavoidable processing steps involved in selective area epitaxy, conduction and valence band offsets of 0.21 ± 0.01 and 0.40 ± 0.01 eV are, respectively, found, indicating the formation of an interface with a quality comparable to two-dimensional In0.53Ga0.47As/InP heterostructures.