A detailed study of the implantation-induced damage in Si on sapphire, carried out by optical-absorption measurements extending from energies above the band gap down to energies far into the subgap region of Si, is presented. The changes induced in the optical band gap, band-edge slopes, and in the subgap features of the spectra are carefully described. The various stages of formation and quenching of divacancies were monitored as a function of implantation conditions and annealing cycles through their 1.8-μm absorption band. It is shown that the divacancies strongly affect the population of band-tail states and the annealing studies revealed that the progressive quenching of the divacancy band is followed by the appearance of another absorption band, characteristic of some intrinsic secondary defect, whose annealing behavior is similar to the one observed for the five-vacancy electron-paramagnetic-resonance spectrum. The study of the structural relaxation process in implanted a-Si gave indications that the process is indeed associated with annihilation of defects as well as average strain reduction in the material, in agreement with earlier indications. Finally, some common features, such as band-edge inverse-logarithmic slope values and subgap features, are found in annealed implanted crystalline and a-Si.

Damage formation in $〈111〉$ - and $〈112〉$ -oriented CdTe single crystals irradiated at room temperature and 15 K with 270 keV Ar or 730 keV Sb ions was investigated in situ using Rutherford backscattering spectroscopy (RBS) in channeling configuration. Defect profiles were calculated from the RBS spectra using the computer code DICADA and additional energy-dependent RBS measurements were performed to identify the type of defects. At both temperatures no formation of a buried amorphous layer was detected even after prolonged irradiation with several ${10}^{16}$ ions/cm². The fact that CdTe is not rendered amorphous even at 15 K suggests that the high resistance to amorphization is caused by the high ionicity of CdTe rather than thermal effects. The calculated defect profiles show the formation of a broad defect distribution that extends much deeper into the crystal than the projected range of the implanted ions at both temperatures. The post-range defects in CdTe thus do not seem to be of thermal origin either, but are instead believed to result from migration driven by the electronic energy loss.