The integration of a complex set of electronic design automation (EDA) tools to enhance interoperability is a critical concern for circuit designers. Recent advancements in large language models (LLMs) have showcased their exceptional capabilities in natural language processing and comprehension, offering a novel approach to interfacing with EDA tools. This research article introduces ChatEDA, an autonomous agent for EDA empowered by an LLM, AutoMage, complemented by EDA tools serving as executors. ChatEDA streamlines the design flow from the register-transfer level (RTL) to the graphic data system version II (GDSII) by effectively managing task decomposition, script generation, and task execution. Through comprehensive experimental evaluations, ChatEDA has demonstrated its proficiency in handling diverse requirements, and our fine-tuned AutoMage model has exhibited superior performance compared to GPT-4 and other similar LLMs.

Inverse lithography technology (ILT) plays a crucial role in optical proximity correction, tending to generate curvilinear masks for optimal process windows. Traditional curvilinear mask manufacturing involves fracturing into rectangles, requiring expensive mask write times. A novel E-beam mask writer that writes variable radius circles per shot significantly reduces the shot count for curvilinear masks. To exploit this mask writer's benefits, we present two methods to generate circular fracturing-aware masks. The first one converts pixel-based masks from existing ILT methods into circle-based masks using predefined rules. The second one integrates circular constraints into the ILT process, generating circle-based masks directly via optimization. Extensive experimental results validate both approaches' effectiveness.

In VLSI design, accurate pre-routing timing prediction is paramount. Traditional machine learning-based methods require extensive data, posing challenges for advanced technology nodes due to the time-consuming data preparation. To mitigate this issue, we propose a novel transfer learning framework that uses data from previous nodes for learning on the target node. Our method initially disentangles and aligns timing path features across different nodes, then predicts each path's arrival time employing a Bayesian-based model capable of handling highly variable arrival time and generalizing to new designs. Experimental results on transfer learning from 130nm to 7nm nodes validate our method's effectiveness.

Design Rule Checking (DRC) is a critical step in integrated circuit design. DRC requires formatted scripts as the input to design rule checkers. However, these scripts are manually generated in the foundry, which is tedious and error prone for generation of thousands of rules in advanced technology nodes. To mitigate this issue, we propose the first DRC script generation framework, leveraging a deep learning-based key information extractor to automatically identify essential arguments from rules and a script translator to organize the extracted arguments into executable DRC scripts. We further enhance the performance of the extractor with three specific design rule generation techniques and a multi-task learning-based rule classification module. Experimental results demonstrate that the framework can generate a single rule script in 5.46 ms on average, with the extractor achieving 91.1% precision and 91.8% recall on the key information extraction. Compared with the manual generation, our framework can significantly reduce the turnaround time and speed up process design closure.

In the domain of very-large-scale integration (VLSI) design, the accuracy of prerouting timing prediction is of paramount importance for ensuring the performance and reliability of integrated circuits. Traditional methods based on machine learning necessitate the availability of extensive and high-quality datasets. However, this requirement poses significant challenges for advanced technology nodes due to the laborious and time-intensive nature of data preparation. To address this critical issue, we introduce a novel transfer learning framework that leverages data from preceding technology nodes to facilitate learning and prediction on the target node. Our methodology commences with the disentanglement and alignment of timing path features across different nodes, ensuring the preservation and effective translation of intrinsic timing path properties. Subsequently, we employ a Bayesian-based model to predict the arrival times of individual timing paths. This model is particularly adept at managing the high-variability inherent in arrival times and exhibits strong generalization capabilities to novel design scenarios. Moreover, we propose a new algorithm to reweight the preceding node data during training by estimating their transferability through the cell type distribution. We validate the efficacy of our proposed framework through comprehensive experimental evaluations, demonstrating successful transfer learning from 130 or 45 to 7-nm technology nodes. The results underscore the potential of our approach to significantly mitigate the dependency on extensive data preparation while maintaining high accuracy in timing prediction for cutting-edge VLSI designs.