Thin Titanium films were fabricated on quartz substrates by radio frequency magnetron sputtering under high vacuum. Subsequent annealing at temperatures of 600 ${}^{\circ }$C in air resulted in single-phase ${TiO}_2$ with the structure of rutile, as X-ray diffraction experiment demonstrates. Atomic-force microscopy images verify the high crystalline quality and allow us to determine the grain size even for ultrathin ${TiO}_2$ films. Rutile has a direct energy band gap at about 3.0–3.2 eV; however, the transitions between the valence and conduction band are dipole forbidden. Just a few meV above that, there is an indirect band gap. The first intense absorption peak appears at about 4 eV. Tauc plots for the position of the indirect band gap show a “blue shift” with decreasing film thickness. Moreover, we find a similar shift for the position of the first absorbance peak studied by the derivative method. The results indicate the presence of quantum confinement effects. This conclusion is supported by theoretical calculations based on a combination of the effective mass theory and the Hartree Fock approximation.

The microstructure of aluminum thin films, including the grain morphology and surface roughness, are key parameters for improving the thermal or electrical properties and optical reflectance of films. The first step in optimizing these parameters is a thorough understanding of the grain growth mechanisms and film structure. To investigate these issues, thin aluminum films with thicknesses ranging from 25 to 280 nm were coated on SiO_x/Si substrates at ambient temperature under high-vacuum conditions and a low argon pressure of 3 × 10⁻³ mbar (0.3 Pa) using the radio frequency magnetron sputtering method. Quantitative analyses of the surface roughness and nanograin characteristics were conducted using atomic force microscopy (AFM), transmission electron microscopy (TEM), and X-ray diffraction. Changes in specular reflectance were measured using ultraviolet–visible and near-infrared spectroscopy. The low roughness values obtained from the AFM images resulted in high film reflectivity, even for thicker films. TEM and AFM results indicate monomodal, randomly oriented grain growth without a distinct columnar or spherical morphology. Using TEM cross-sectional images and the dependence of the grain size on the film thickness, we propose a grain growth mechanism based on the diffusion mobility of aluminum atoms through grain boundaries.

Plasmonic applications have traditionally relied on noble metals such as gold (Au) and silver (Ag) for their excellent plasmonic performance in the visible and near-infrared spectrum. However, these metals are costly, scarce, and have limitations such as low stability (Ag) and interband transition losses, which restrict their spectral range. To address these issues, alternative plasmonic materials have been explored. One such material is aluminum (Al), which is inexpensive, abundant, and exhibits remarkable plasmonic properties in the UV region as well as wide tunability. Al is also compatible with complementary metal–oxide semiconductor (CMOS) fabrication processes and is very stable due to its ultrathin native oxide layer. Alloying different metals can combine their advantageous properties, resulting in enhanced tunable optical characteristics. This study investigates the LSPR properties of AgAl alloy nanoparticles grown after the annealing of precursor AgAl bilayer films. Interestingly, LSPRs were also observed in some cases for the as-deposited bilayers. The experimental results were complemented with simulations conducted via the rigorous coupled-wave analysis (RCWA) method. The investigated materials could be potentially useful for applications in energy harvesting or color printing.

Thin Mo films in the thickness range between 1 and 164 nm have been deposited on high-quality quartz and Corning glass substrates by Radio Frequency (RF) magnetron sputtering under high vacuum (base pressure ~ 3 × 10^-7 mbar). The sputtering target was metallic Mo. Subsequent short annealing of Mo at temperatures between about 400 °C - 600 °C in a muffle furnace in air produced MoO₃ thin films. Heating even to 400°C resulted in significant growth of crystal size. Surprisingly, films thinner than about 50 nm could not be heated at higher temperatures due to the evaporation of the oxide. Ultraviolet – visible light absorption spectroscopy experiments were employed for the determination of the optical band gap. The results for direct and indirect allowed transitions are discussed.

Perpendicular magnetic anisotropy at transition metal/oxide interfaces plays a significant role in technological applications such as magnetic storage and spintronics. In this study, we investigate the effects of thermal annealing and Pt ultrathin interlayers on the magnetic anisotropy in Ni/NiO multilayers. Ni/NiO/Pt multilayers were fabricated via radiofrequency magnetron sputtering and natural oxidation. The static magnetic properties of the samples were studied using temperature-dependent SQUID magnetometry. We focus on a sample with a Nickel thickness of 6.7 nm in each multilayer period. This multilayer in Ni/NiO form showed the maximum enhancement of perpendicular magnetic anisotropy after mild thermal annealing in past work. In this work, we study the effects of ultrathin Pt interlayers on the magnetic properties of such a Ni/NiO multilayer before and after annealing. We have observed a further increase in perpendicular magnetic anisotropy, and we study the temperature-dependent magnetic properties of this system, which combines the favorable magnetic properties of Ni/Pt and Ni/NiO multilayers.

Composite ZnO/Fe nanostructured thin films are synthesized via physical vapor deposition using radio frequency magnetron sputtering in conventional, as well as in glancing angle deposition (GLAD) geometries. ZnO is employed as a compact nanocolumnar template to direct Fe growth in bilayer and multilayer architectures. Morphological analysis reveals well-defined ZnO/Fe interfaces for normal deposition geometry, with diminished interface clarity and reduced layer thickness in GLAD samples. Crystallographic characterization indicates clear ZnO-{002} and α-Fe-{110} texture. Magnetostatic characterization investigates the effects of morphology on coercivity and domain nucleation. GLAD-deposited Fe films exhibit clear in-plane magnetic anisotropy, with remanence to saturation magnetization (M_REM/M_SAT) equal to 1 for the easy axis and equal to 0.24 for the hard axis, consistent with inclined nanocolumn morphology. Our findings show that deposition geometry, rather the ZnO template, mostly affects the morphology of Fe films. The above, highlight the potential of engineered ZnO/Fe nanocomposites for magnetic, spintronic, and magnetoplasmonic applications, by tuning morphology and interface quality through deposition parameters.