Graham Reed

Graham Reed


Research Focus & Metrics

Academic Career Length

24Years (2003-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

View All Publications
12 December 2013 in Nanophotonics
Verified
Journal Article
Closed access
PDF file
GRGraham Reed
Graham Reed
GMGoran Z. Mashanovich
Goran Z. Mashanovich
FGFrederic Y. Gardes
Frederic Y. Gardes
MNMilos Nedeljkovic
Milos Nedeljkovic
YHYoufang Hu
Youfang Hu
SHShawn S. Hsu
Shawn S. Hsu

10 May 2019 in IEEE Journal of Selected Topics in Quantum Electronics
Verified
Journal Article
Closed access
ARAbdul Rahim
Abdul Rahim
JGJeroen Goyvaerts
Jeroen Goyvaerts
BSBertrand Szelag
Bertrand Szelag
JFJean-Marc Fedeli
Jean-Marc Fedeli
PAPhilippe Absil
Philippe Absil
Roel BaetsRoel Baets
Roel Baets
Offering open-access silicon photonics-based technologies has played a pivotal role in unleashing this technology from research laboratories to industry. Fabless enterprises rely on the open-access of these technologies for their product development. In the last decade, a diverse set of open-access technologies with medium and high technology readiness levels have emerged. This paper provides a review of the open-access silicon and silicon nitride photonic IC technologies offered by the pilot lines of European research institutes and companies. The paper also highlights upcoming features of these platforms and discusses how they address the long-term market needs.

23 October 2023 in Nature Electronics
Verified
Journal Article
Open access
PDF file
KLKe Li
Ke Li
DTDavid J. Thomson
David J. Thomson
SLShenghao Liu
Shenghao Liu
WZWeiwei Zhang
Weiwei Zhang
WCWei Cao
Wei Cao
GRGraham Reed
Graham Reed
The widening application of advanced digital infrastructure requires the development of communications technologies with increased data transmission rates. However, ensuring that this can be achieved in an energy-efficient way is challenging. Here we report an integrated complementary metal–oxide–semiconductor/silicon-photonics-based transmitter in which a switching current is applied to the passive-equalization-network-guided silicon Mach–Zehnder modulator, rather than driving a standard Mach–Zehnder modulator with a traditional voltage swing. This approach allows the total electrical energy to be selectively distributed to different frequency components by choosing an appropriate inductance and near-end termination impedance values. With the approach, we achieve 112 gigabaud—112 gigabits per second on–off keying and 224 gigabit per second pulse-amplitude modulation with four levels—transmission with energy efficiencies below picojoules per bit, and without the need for signal-shaping functions in the data source. We also investigate the bit error rate for different electrical and optical power conditions at 100 gigabaud, including the electrical power consumption of the driver amplifier.

16 October 2017 in Journal of Lightwave Technology
Verified
Journal Article
Closed access
GCGuoyao Chen
Guoyao Chen
Jiangbing DuJiangbing Du
Jiangbing Du
LSLin Sun
Lin Sun
WZWenjia Zhang
Wenjia Zhang
Ke XuKe Xu
Ke Xu
ZHZuyuan He
Zuyuan He
We demonstrated a support vector machine (SVM) based machine learning method to mitigate modulation nonlinearity distortion for PAM-4 and PAM-8 signals over a VCSEL-MMF optical link. Simulations at 100 Gbps data rate and experimental work at 60 Gbps data rate were carried out. We achieved a significant improvement in BER when complete binary tree SVMs (CBT-SVMs) are applied for both PAM-4 and PAM-8 signals. Quantitative analysis of the sensitivity gain versus modulation nonlinearity distortion is presented with experimentally verification. The results indicate that CBT-SVMs have better performance for PAM-8 compared to PAM-4. The sensitivity gain increases almost linearly with the increase of eye-linearity (increase of modulation nonlinearity distortion). Up to 2.5-dB sensitivity improvement is achieved by the proposed CBT-SVMs at eye-linearity of 1.72 for PAM-4.

19 November 2020 in Applied Sciences
Verified
Journal Article
Open access
PDF file
Callum LittlejohnsCallum Littlejohns
Callum Littlejohns
DRDavid James Rowe
David James Rowe
HDHan Du
Han Du
KLKe Li
Ke Li
WZWeiwei Zhang
Weiwei Zhang
GRGraham Reed
Graham Reed
The field of silicon photonics has experienced widespread adoption in the datacoms industry over the past decade, with a plethora of other applications emerging more recently such as light detection and ranging (LIDAR), sensing, quantum photonics, programmable photonics and artificial intelligence. As a result of this, many commercial complementary metal oxide semiconductor (CMOS) foundries have developed open access silicon photonics process lines, enabling the mass production of silicon photonics systems. On the other side of the spectrum, several research labs, typically within universities, have opened up their facilities for small scale prototyping, commonly exploiting e-beam lithography for wafer patterning. Within this ecosystem, there remains a challenge for early stage researchers to progress their novel and innovate designs from the research lab to the commercial foundries because of the lack of compatibility of the processing technologies (e-beam lithography is not an industry tool). The CORNERSTONE rapid-prototyping capability bridges this gap between research and industry by providing a rapid prototyping fabrication line based on deep-UV lithography to enable seamless scaling up of production volumes, whilst also retaining the ability for device level innovation, crucial for researchers, by offering flexibility in its process flows. This review article presents a summary of the current CORNERSTONE capabilities and an outlook for the future.

29 August 2008 in Journal of Lightwave Technology
Verified
Journal Article
Closed access
MMMilan M. Milosevic
Milan M. Milosevic
PMPetar S. Matavulj
Petar S. Matavulj
BTBranislav D. Timotijevic
Branislav D. Timotijevic
GRGraham Reed
Graham Reed
GMGoran Z. Mashanovich
Goran Z. Mashanovich
There is a trend towards miniaturization of silicon photonic circuits due to superior performance and small cost. Design rules that must be imposed on the geometry of optical waveguides to make them behave as polarization-independent and single-mode devices are well known for waveguides with relatively large cross sections and for some small cross-sectional rib waveguides with vertical sidewalls and an air top cladding. The influence of the top oxide cover on waveguide birefringence was analyzed recently, but only for relatively large cross-sectional waveguides. This paper reports simulations for both single-mode and polarization-independent behavior for small cross-sectional waveguides with variable rib width, etch depth, top oxide cover thickness, and side-wall angle. The results show that the stress-induced effects must be taken into account to satisfy both requirements. Design rules to maintain birefringence-free operation and to satisfy single-mode behavior for small rib silicon-on-insulator (SOI) waveguides are presented.