Optical measurements of temperature-dependent photoluminescence (PL) spectral peak, integrated PL intensity and PL decay time, and microstructure analyses with high-resolution transmission electron microscopy showed the strong dependencies of thermal annealing effects on quantum well (QW) width in InGaN/GaN QW structures. With different QW widths, different levels of strain energy were built. Upon thermal annealing, energy relaxation resulted in the reshaping of quantum dots and hence the changes of optical properties. Thermal annealing at 800 °C of a narrow QW width (2 nm) structure led to regularly distributed quantum dots (QDs) and improved optical quality. However, thermal annealing at the same temperature of a sample of larger QW width (4 nm) did not show QD formation. In this situation, even higher local strains around QWs were speculated. Also, degraded optical quality was observed.

The features of eight-period In0.2Ga0.8N/GaN quantum wells (QWs) with silicon (Si) doping in the first two to five quantum barriers (QBs) in the growth sequence of blue light-emitting diodes (LEDs) are explored. Epilayers of QWs’ structures are grown on 20 pairs of In0.02Ga0.98N/GaN superlattice acting as strain relief layers (SRLs) on patterned sapphire substrates (PSSs) by a low-pressure metal-organic chemical vapor deposition (LP-MOCVD) system. Temperature-dependent photoluminescence (PL) spectra, current versus voltage (I-V) curves, light output power versus injection current (L-I) curves, and images of high-resolution transmission electron microscopy (HRTEM) of epilayers are measured. The consequences show that QWs with four Si-doped QBs have larger carrier localization energy (41 meV), lower turn-on (3.27 V) and breakdown (− 6.77 V) voltages, and higher output power of light of blue LEDs at higher injection current than other samples. Low barrier height of QBs in a four-Si-doped QB sample results in soft confinement potential of QWs and lower turn-on and breakdown voltages of the diode. HRTEM images give the evidence that this sample has relatively diffusive interfaces of QWs. Uniform spread of carriers among eight QWs and superior localization of carriers in each well are responsible for the enhancement of light output power, in particular, for high injection current in the four-Si-doped QB sample. The results demonstrate that four QBs of eight In0.2Ga0.8N/GaN QWs with Si doping not only reduce the quantum-confined Stark effect (QCSE) but also improve the distribution and localization of carriers in QWs for better optical performance of blue LEDs.

A large-area spray coating process is introduced to efficiently apply a graphene/Cu/cellulose composite on a flexible glass substrate. The dispersion characteristics of nano-additives are measured and the Tyndall effect observed. The characteristics of the composite coating such as the film thickness, surface roughness, water contact angle, and lubricating characteristics are measured. The tribological properties of the composite coating are measured using a ball-on-disk. The wear width of the abrasive parts, as well as the wear and friction coefficient of the grinding balls, are investigated. Adding graphene/Cu helps to improve the anti-wear ability of cellulose. The transfer layer was observed using the Raman spectroscopy and mapping technology. Finally, the lubricating mechanism is discussed, and the wear mechanism is proposed. Nanoparticles existed in the wear track as the third-body particles and improved the load capacity of the composites. The wear mechanism of the composites is discussed in terms of the worn surfaces and the analysis of the transfer film with the third-body approach.

Characteristics of atomic layer deposition (ALD)-grown ZnO thin films on sapphire substrates with and without three-pulsed ozone (O₃) as oxidant precursor and post-deposition thermal annealing (TA) are investigated. Deposition temperature and thickness of ZnO epilayers are 180 °C and 85 nm, respectively. Post-deposition thermal annealing is conducted at 300 °C in the ambience of oxygen (O₂) for 1 h. With strong oxidizing agent O₃ and post-deposition TA in growing ZnO, intrinsic strain and stress are reduced to 0.49% and 2.22 GPa, respectively, with extremely low background electron concentration (9.4 × 10¹⁵ cm⁻³). This is originated from a lower density of thermally activated defects in the analyses of thermal quenching of the integrated intensity of photoluminescence (PL) spectra. TA further facilitates recrystallization forming more defect-free grains and then reduces strain and stress state causing a remarkable decrease of electron concentration and melioration of surface roughness.

We report the fast and slow decay lifetimes of multi- component photoluminescence (PL) intensity decays in the time-resolved photoluminescence measurements at the room temperature and a low temperature. The fast decay component was essentially due to carrier dynamics, that is, carrier flow between strongly localized and weakly localized states. Such a carrier relaxation process results in extremely long PL decay time for strongly localized states at the low temperature. At room temperature, because of thermal energy and hence carrier escape form strongly localized states, effective lifetimes becomes stronger.