Xuefang Xiao

Dr. Xuefang Xiao


Research Focus & Metrics

Academic Career Length

2Years (2025-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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23 October 2025 in Electronic Materials
Verified
Journal Article
Open access
PDF file
WZWeiyi Zheng
Weiyi Zheng
YZYuyan Zhang
Yuyan Zhang
ZCZhifeng Chen
Zhifeng Chen
QGQiaoying Gan
Qiaoying Gan
XXXuefang Xiao
Xuefang Xiao
Chengying ChenChengying Chen
Chengying Chen
In the post-Moore era, carbon nanotube field-effect transistors (CNTFETs) are a promising alternative to complementary metal-oxide-semiconductor (CMOS) technology at and below the 5 nm node. Compact models bridge circuit design and device physics, yet the electrostatic discharge (ESD) behavior of CNTFETs remains insufficiently captured. Focusing on the local bottom-gate (LBG) CNTFET structure, which offers enhanced gate control due to its bottom-gate configuration, this paper investigates three dominant ESD-triggering mechanisms—thermionic current, tunneling leakage current, and thermal failure breakdown. Then, a hybrid compact–behavioral ESD model for CNTFETs is established. After theoretical derivation and comparison with test results, the model parameters are optimized through fitting. The simulation results exhibit excellent agreement with CNTFET measurements, particularly capturing the Human Body Model (HBM) pre-charge threshold phenomenon at 72 V and accurately predicting the subsequent voltage collapse behavior. This validates the accuracy and effectiveness of the model, laying a theoretical and experimental foundation for further construction of carbon-based standard-cell and I/O libraries.