Over the past decade, the development of amperometric sensors and biosensors using microfabrication techniques has gained considerable attention. This interdisciplinary approach aims at bringing together scientific fields such as: chemistry, physics, engineering and biology to achieve devices’ miniaturization, integration and automatization. Among the technologies that have been reviewed for the fabrication of the microelectrodes, the most common are: soft lithography and microfabrication techniques, such as physical vapor deposition of different metals, photolithography, chemical wet etching method and anodic bonding process. The required parameters in the design of a microfabricated electrode array, such as inter-electrode distance, the three-electrode system, and the role of each electrode have been intensively discussed. This review provides an overview about the state-of-the-art microfabrication devices and their applications, as well as the recent advances in the fabrication of microelectrodes as transducers for amperometric sensors, immunosensors and biosensors with various applications in environmental, biomedical and pharmaceutical fields.

The research field of metasurfaces has attracted considerable attention in recent years due to its high potential to achieve flat, ultrathin optical devices of high performance. Metasurfaces, consisting of artificial patterns of subwavelength dimensions, often require fabrication techniques with high aspect ratios (HARs). Bosch and Cryogenic methods are the best etching candidates of industrial relevance towards the fabrication of these nanostructures. In this paper, we present the fabrication of Silicon (Si) metalenses by the UV-Nanoimprint Lithography method and cryogenic Deep Reactive Ion Etching (DRIE) process and compare the results with the same structures manufactured by Bosch DRIE both in terms of technological achievements and lens efficiencies. The Cryo- and Bosch-etched lenses attain efficiencies of around 39% at wavelength λ = 1.50 µm and λ = 1.45 µm against a theoretical level of around 61% (for Si pillars on a Si substrate), respectively, and process modifications are suggested towards raising the efficiencies further. Our results indicate that some sidewall surface roughness of the Bosch DRIE is acceptable in metalense fabrication, as even significant sidewall surface roughness in a non-optimized Bosch process yields reasonable efficiency levels.

This study presents the design and manufacture of metasurface lenses optimized for focusing light with 1.55 µm wavelength. The lenses are fabricated on silicon substrates using electron beam lithography, ultraviolet-nanoimprint lithography and cryogenic deep reactive-ion etching techniques. The designed metasurface makes use of the geometrical phase principle and consists of rectangular pillars with target dimensions of height h = 1200 nm, width w = 230 nm, length l = 354 nm and periodicity p = 835 nm. The simulated efficiency of the lens is 60%, while the master lenses obtained by using electron beam lithography are found to have an efficiency of 45%. The lenses subsequently fabricated via nanoimprint are characterized by an efficiency of 6%; the low efficiency is mainly attributed to the rounding of the rectangular nanostructures during the pattern transfer processes from the resist to silicon due to the presence of a thicker residual layer.

As metasurfaces begin to find industrial applications there is a need to develop scalable and cost-effective fabrication techniques which offer sub-100 nm resolution while providing high throughput and large area patterning. Here we demonstrate the use of UV-Nanoimprint Lithography and Deep Reactive Ion Etching (Bosch and Cryogenic) towards this goal. Robust processes are described for the fabrication of silicon rectangular pillars of high pattern fidelity. To demonstrate the quality of the structures, metasurface lenses, which demonstrate diffraction limited focusing and close to theoretical efficiency for NIR wavelengths λ ∈ (1.3 μm, 1.6 μm), are fabricated. We demonstrate a process which removes the characteristic sidewall surface roughness of the Bosch process, allowing for smooth 90-degree vertical sidewalls. We also demonstrate that the optical performance of the metasurface lenses is not affected adversely in the case of Bosch sidewall surface roughness with 45 nm indentations (or scallops). Next steps of development are defined for achieving full wafer coverage.

NO₂ gas surface acoustic wave (SAW)sensors are under continuous development due to their high sensitivity, reliability, low cost and room temperature operation. Their integration ability with different receptor nanomaterials assures a boost in the performance of the sensors. Among the most exploited nano-materials for sensitive detection of NO₂ gas molecules are carbon-based nanomaterials, metal oxide semiconductors, quantum dots, and conducting polymers. All these nanomaterials aim to create pores for NO₂ gas adsorption or to enlarge the specific surface area with ultra-small nanoparticles that increase the active sites where NO₂ gas molecules can diffuse. This review provides a general overview of NO₂ gas SAW sensors, with a focus on the different sensors’ configurations and their fabrication technology, on the nanomaterials used as sensitive NO₂ layers and on the test methods for gas detection. The synthesis methods of sensing nanomaterials, their functionalization techniques, the mechanism of interaction between NO₂ molecules and the sensing nanomaterials are presented and discussed.

This paper presents the design and fabrication of a MEMS chevron-type thermal actuator. The device was designed for fabrication in the standard MEMS technology, where the topography of the upper layers depends on the patterns of structural and sacrificial layers underneath. The proposed actuator presents some advantages over usual thermal vertical chevron actuators by means of low operating voltages, high output force and linear movement without deformation of the shaft. The device simulations were done using COVENTOR software. The movement obtained by simulation was 12 μm, for a voltage of 0.2 V and the current intensity of 257 mA. The design optimizes the in-plane displacement by fixed anchors and beam inclination angle. Heating is provided by Joule dissipation. The material used for manufacture of chevron-based actuator was aluminum due to its thermal and mechanical properties. The release of the movable part was performed using isotropic dry etching by Reactive Ion Etching (RIE). A first inspection was achieved using Scanning Electron Microscope (SEM). In order to obtain the in-plane displacement we carried out electrical measurements. The thermal actuator can be used for a variety of optical and microassembling applications. This kind of thermal actuator could be integrated easily with other micro devices since its fabrication is compatible with the general semiconductor processes.