Xintong Xie

Dr. Xintong Xie

orcid

Research Focus & Metrics

Academic Career Length

9Years (2018-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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16 September 2024 in Micromachines
Verified
Journal Article
Open access
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JXJuan Xiong
Juan Xiong
XXXintong Xie
Xintong Xie
JWJie Wei
Jie Wei
SSShuxiang Sun
Shuxiang Sun
Xiaorong LuoXiaorong Luo
Xiaorong Luo
In this paper, a novel AlGaN/GaN HEMT structure with a P-GaN buried layer in the buffer layer and a locally doped barrier layer under the gate (PN-HEMT) is proposed to enhance its resistance to single event transient (SET) effects while also overcoming the degradation of other characteristics. The device operation mechanism and characteristics are investigated by TCAD simulation. The results show that the peak electric field and impact ionization at the gate edges are reduced in the PN-HEMT due to the introduced P-GaN buried layer in the buffer layer. This leads to a decrease in the peak drain current (Ipeak) induced by the SET effect and an improvement in the breakdown voltage (BV). Additionally, the locally doped barrier layer provides extra electrons to the channel, resulting in higher saturated drain current (ID,sat) and maximum transconductance (gmax). The Ipeak of the PN-HEMT (1.37 A/mm) is 71.8% lower than that of the conventional AlGaN/GaN HEMT (C-HEMT) (4.85 A/mm) at 0.6 pC/µm. Simultaneously, ID,sat and BV are increased by 21.2% and 63.9%, respectively. Therefore, the PN-HEMT enhances the hardened SET effect of the device without sacrificing other key characteristics of the AlGaN/GaN HEMT.

25 February 2025 in IEEE Electron Device Letters
Verified
Journal Article
Closed access
XXXintong Xie
Xintong Xie
SSShuxiang Sun
Shuxiang Sun
JSJingyu Shen
Jingyu Shen
RLRenkuan Liu
Renkuan Liu
GDGaoqiang Deng
Gaoqiang Deng
Xiaorong LuoXiaorong Luo
Xiaorong Luo
In this work, it is demonstrated for the first time that a negative gate voltage (VGS) during off-state can enhance the single-event effect (SEE) hardness of the 100-V E-mode p-GaN HEMTs. When subjected to irradiation from Ta ions with linear energy transfer of 78.40 MeV/(mg/cm2), the single-event transient (SET) current peak during irradiation can be significantly decreased if a negative VGS is applied, as opposed to using zero VGS. Furthermore, a negative VGS suppresses post-irradiation shifts in gate capacitance (CG), threshold voltage (Vth) and off-state drain leakage current (IDSS), indicating improved stability against SEE. Numerical simulations have been performed to offer a physical insight into the underlying mechanisms. It is found that a negative VGS enables the simultaneous removal for radiation-induced holes and thus suppresses the SET current. The post-irradiation degradation of CG, Vth and IDSS are attributed to the radiation-induced acceptor-like traps at the Schottky junction, the AlGaN/GaN interface and the buffer layer, respectively.

26 August 2021 in IEEE Transactions on Electron Devices
Verified
Journal Article
Closed access
GDGaoqiang Deng
Gaoqiang Deng
ZMZhen Ma
Zhen Ma
Xiaorong LuoXiaorong Luo
Xiaorong Luo
XXXintong Xie
Xintong Xie
CLCongcong Li
Congcong Li
WNWai Tung Ng
Wai Tung Ng
A 600 V-rated insulated gate bipolar transistor (IGBT) with improved turn-on transient characteristics is proposed and investigated by simulation. The proposed IGBT features a built-in voltage-clamping structure. The floating ${p}$ -body adjacent to the trench gate is clamped at an appropriately high voltage before turn-on. This slows down the hole accumulation process in the floating p -body during turn-on transient, and thus the self-charging displacement current through the gate capacitance is reduced. The increasing rate for the gate voltage ( dV GE / dt ) is then reduced. As a result, the proposed IGBT achieves a 25% decrease in collector current ( $I_C$ ) overshoot and 34% decrease in dI C / dt , when compared with the conventional IGBT with the same turn-on loss ( E ON ), at IC = 250 A/cm 2 under hard-switching. Its fabrication process is compatible with conventional trench IGBT.

4 January 2024 in Microelectronics Journal
Verified
Journal Article
Closed access
XXXintong Xie
Xintong Xie
SSShuxiang Sun
Shuxiang Sun
ZZZhijia Zhao
Zhijia Zhao
PZPengfei Zhang
Pengfei Zhang
JWJie Wei
Jie Wei
XLXiaorong Luo
Xiaorong Luo

1 August 2018 in Talanta
Verified
Journal Article
Closed access
JZJuan Zheng
Juan Zheng
CLCuiming Lu
Cuiming Lu
JHJunlong Huang
Junlong Huang
LCLuyi Chen
Luyi Chen
CNChuyi Ni
Chuyi Ni
GOGangfeng Ouyang
Gangfeng Ouyang

28 May 2025 in IEEE Transactions on Power Electronics
Verified
Journal Article
Closed access
GDGaoqiang Deng
Gaoqiang Deng
XBXihao Bi
Xihao Bi
JSJingyu Shen
Jingyu Shen
RLRenkuan Liu
Renkuan Liu
YYYingyi Yan
Yingyi Yan
Xiaorong LuoXiaorong Luo
Xiaorong Luo
In this work, it is demonstrated that the buck converter using a GaN/Si hybrid switch can achieve an even higher power conversion efficiency than the one using a pure-GaN switch with the same ratings. By replacing one of the dual paralleled GaN HEMTs with a Si superjunction mosfet having the same voltage rating yet a slightly higher resistance, the total conduction loss, however, is significantly decreased. This is accomplished through suppressing the dynamic ON-state resistance peculiar to GaN HEMTs. Optimizing the gate timing between the GaN and the Si devices within the hybrid switch enables exceptional low-loss performance. Both device-level and system-level demonstrations are performed. The experimental results prove that the p-GaN gate HEMT/Si MOSFET hybrid switch increases the efficiency by 2% and 3%, respectively, when compared to its pure-GaN and pure-Si counterparts, at an output power of 240 W and a switching frequency of 500 kHz.