Classically, a dwell-time map is created with a method such as deconvolution or numerical optimization, with the input being a surface error map and influence function. This dwell-time map is the numerical optimum for minimizing residual form error, but it takes no account of machine dynamics limitations. The map is then reinterpreted as machine speeds and accelerations or decelerations in a separate operation. In this paper we consider combining the two methods in a single optimization by the use of a constrained nonlinear optimization model, which regards both the two-norm of the surface residual error and the dwell-time gradient as an objective function. This enables machine dynamic limitations to be properly considered within the scope of the optimization, reducing both residual surface error and polishing times. Further simulations are introduced to demonstrate the feasibility of the model, and the velocity map is reinterpreted from the dwell time, meeting the requirement of velocity and the limitations of accelerations or decelerations. Indeed, the model and algorithm can also apply to other computer- controlled subaperture methods.

A calibrated and predictive model of the removal function has been established based on the analysis of a magnetorheological finishing (MRF) process. By introducing an efficiency coefficient of the removal function, the model can be used to calibrate the removal function in a MRF figuring process and to accurately predict the removal function of a workpiece to be polished whose material is different from the spot part. Its correctness and feasibility have been validated by simulations. Furthermore, applying this model to the MRF figuring experiments, the efficiency coefficient of the removal function can be identified accurately to make the MRF figuring process deterministic and controllable. Therefore, all the results indicate that the calibrated and predictive model of the removal function can improve the finishing determinacy and increase the model applicability in a MRF process.

Nanoscale laser damage precursors generated from fabrication have emerged as a new bottleneck that limits the laser damage resistance improvement of fused silica optics. In this paper, ion beam etching (IBE) technology is performed to investigate the evolutions of some nanoscale damage precursors (such as contamination and chemical structural defects) in different ion beam etched depths. Surface material structure analyses and laser damage resistance measurements are conducted. The results reveal that IBE has an evident cleaning effect on surfaces. Impurity contamination beneath the polishing redeposition layer can be mitigated through IBE. Chemical structural defects can be significantly reduced, and surface densification is weakened after IBE without damaging the precision of the fused silica surface. The photothermal absorption on the fused silica surface can be decreased by 41.2%, and the laser-induced damage threshold can be raised by 15.2% after IBE at 250 nm. This work serves as an important reference for characterizing nanoscale damage precursors and using IBE technology to increase the laser damage resistance of fused silica optics.

In the high-power laser system, the mid-spatial frequency error of the surface of the high-power laser component will affect the normal operation of the high-power laser system. In order to improve the mid-spatial frequency error of the high-power laser component after magnetorheological finishing, the causes and influencing factors of the ribbon fluctuation in magnetorheological finishing are studied, and the influence of different ribbon fluctuation on the mid-spatial frequency error of the surface is studied. Firstly, the influence of different ribbon fluctuations on the mid-spatial frequency error of the machined surface is simulated by a computer. Secondly, the magnetic field in the circumferential direction of the polishing wheel, the fluctuation amount and frequency of the magnetorheological polishing ribbon are measured, and then the causes of the fluctuation of the magnetorheological polishing ribbon are analyzed. Moreover, through the principle of a single variable, the influence of process parameters on the fluctuation of magnetorheological polishing ribbon is explored. Finally, the fused silica component is scanned uniformly under the process parameters of magnetorheological polishing ribbon fluctuation of 40 μm, 80 μm, 150 μm, and 200 μm. The experimental results show that the greater the ribbon fluctuation, the greater the surface mid-spatial frequency error of the component, and the ribbon fluctuation is approximately linear with the RMS of the PSD2 in the mid-spatial frequency band on the surface of the component. Therefore, the fluctuation of the ribbon can be controlled by controlling the magnetorheological processing parameters, and the mid-spatial frequency band error on the surface of the high-power laser component can be significantly reduced by optimizing process parameters after magnetorheological finishing.

Abrasive water jet polishing has significant advantages in the manufacturing of complex optical components (such as high-slope optical component cavities) that require high-precision manufacturing. This is due to its processing process, in which the polishing tool does not make direct contact with the surface of the workpiece, and instead maintains a considerable distance. However, the removal functions of most existing abrasive water-jet polishing technologies do not possess strict symmetry, which significantly impacts the ability to correct surface figure errors. Therefore, this study implements rotating abrasive water-jet polishing based on traditional abrasive water jet processing to optimize the removal function, which turns it into a Gaussian form; thus, obtaining a type of removal function more suitable for CCOS polishing. This paper derives an empirical formula between the distance s’ from the peak removal point of the removal function to the stagnation point and the nozzle tilt angle α, based on geometric relationships and experimental results, analyzes the relationship between material removal efficiency, nozzle tilt angle, and standoff distance. Finally, this paper verifies through experiments the validity of this empirical formula under different process parameters. Therefore, this study obtains the process conditions that allow rotating abrasive water-jet polishing technology to achieve a stable Gaussian form removal function, and the appropriate process parameters to be selected in conjunction with polishing efficiency; thereby, effectively improving the removal function’s corrective ability and manufacturing efficiency. It provides theoretical support for the processing capability and process parameter selection of abrasive water-jet polishing technology, solves the problem of limited shaping capability of existing abrasive water jet tools, and significantly improves the manufacturing capability of high-end optical components.

High-precision optical component manufacturing by ion beam machining tools with ultra-high material removal resolution and dynamically adjustable removal efficiency is important in various industries. In this paper, we propose a low-energy pulsed ion beam (LPIB) technology that can obtain a single pulse with high-resolution material removal by adjusting the pulse frequency and duty cycle, and enable the dynamic adjustment of the removal efficiency. The pulse frequency is 1–100 Hz, and the duty cycle is 0–100%. For monocrystalline silicon, the pulse frequency and duty cycle are set to 100 Hz and 1%, respectively; thus, the single-shot pulse depth removal resolution of material is 6.7 × 10⁻⁴ nm, which means every 21 pulses can remove one silicon atom layer. Compared with IBF, where the removal resolution of the maximum depth is about 0.01 nm, the controllable resolution is one to two orders of magnitude higher. There is a linear relationship between the removal efficiency of the pulsed ion beam removal function and the pulse duty ratio. The material removal of a single pulse can be adjusted in real time by adjusting the pulse duty cycle and frequency. Owing to its high resolution and wide adjustable removal efficiency, LPIB has broad application prospects in the field of sub-nano-precision surface modification, quality tuning of inertial resonant devices, and so on. This technology is expected to advance surface processing and ultra-precision manufacturing.