Nanoscale laser damage precursors generated from fabrication have emerged as a new bottleneck that limits the laser damage resistance improvement of fused silica optics. In this paper, ion beam etching (IBE) technology is performed to investigate the evolutions of some nanoscale damage precursors (such as contamination and chemical structural defects) in different ion beam etched depths. Surface material structure analyses and laser damage resistance measurements are conducted. The results reveal that IBE has an evident cleaning effect on surfaces. Impurity contamination beneath the polishing redeposition layer can be mitigated through IBE. Chemical structural defects can be significantly reduced, and surface densification is weakened after IBE without damaging the precision of the fused silica surface. The photothermal absorption on the fused silica surface can be decreased by 41.2%, and the laser-induced damage threshold can be raised by 15.2% after IBE at 250 nm. This work serves as an important reference for characterizing nanoscale damage precursors and using IBE technology to increase the laser damage resistance of fused silica optics.

In the high-power laser system, the mid-spatial frequency error of the surface of the high-power laser component will affect the normal operation of the high-power laser system. In order to improve the mid-spatial frequency error of the high-power laser component after magnetorheological finishing, the causes and influencing factors of the ribbon fluctuation in magnetorheological finishing are studied, and the influence of different ribbon fluctuation on the mid-spatial frequency error of the surface is studied. Firstly, the influence of different ribbon fluctuations on the mid-spatial frequency error of the machined surface is simulated by a computer. Secondly, the magnetic field in the circumferential direction of the polishing wheel, the fluctuation amount and frequency of the magnetorheological polishing ribbon are measured, and then the causes of the fluctuation of the magnetorheological polishing ribbon are analyzed. Moreover, through the principle of a single variable, the influence of process parameters on the fluctuation of magnetorheological polishing ribbon is explored. Finally, the fused silica component is scanned uniformly under the process parameters of magnetorheological polishing ribbon fluctuation of 40 μm, 80 μm, 150 μm, and 200 μm. The experimental results show that the greater the ribbon fluctuation, the greater the surface mid-spatial frequency error of the component, and the ribbon fluctuation is approximately linear with the RMS of the PSD2 in the mid-spatial frequency band on the surface of the component. Therefore, the fluctuation of the ribbon can be controlled by controlling the magnetorheological processing parameters, and the mid-spatial frequency band error on the surface of the high-power laser component can be significantly reduced by optimizing process parameters after magnetorheological finishing.

Abrasive water jet polishing has significant advantages in the manufacturing of complex optical components (such as high-slope optical component cavities) that require high-precision manufacturing. This is due to its processing process, in which the polishing tool does not make direct contact with the surface of the workpiece, and instead maintains a considerable distance. However, the removal functions of most existing abrasive water-jet polishing technologies do not possess strict symmetry, which significantly impacts the ability to correct surface figure errors. Therefore, this study implements rotating abrasive water-jet polishing based on traditional abrasive water jet processing to optimize the removal function, which turns it into a Gaussian form; thus, obtaining a type of removal function more suitable for CCOS polishing. This paper derives an empirical formula between the distance s’ from the peak removal point of the removal function to the stagnation point and the nozzle tilt angle α, based on geometric relationships and experimental results, analyzes the relationship between material removal efficiency, nozzle tilt angle, and standoff distance. Finally, this paper verifies through experiments the validity of this empirical formula under different process parameters. Therefore, this study obtains the process conditions that allow rotating abrasive water-jet polishing technology to achieve a stable Gaussian form removal function, and the appropriate process parameters to be selected in conjunction with polishing efficiency; thereby, effectively improving the removal function’s corrective ability and manufacturing efficiency. It provides theoretical support for the processing capability and process parameter selection of abrasive water-jet polishing technology, solves the problem of limited shaping capability of existing abrasive water jet tools, and significantly improves the manufacturing capability of high-end optical components.

Fused silica has become the preferred optical material in the field of inertial confinement fusion (ICF) due to its excellent performance; however, these costly optical elements are vulnerable, and their manufacture is time-consuming. Therefore, the restoration of laser-induced damage for these optical elements is of great value. To restrain the post-restoration raised rim problem in the CO₂ laser repair process to improve the restoration quality, the separate influences of key parameters of laser power, irradiation duration, and laser beam diameter on post-restoration pit morphology are compared in combined simulation and experimental studies. An optimized, patterned CO2 laser strategy is proposed and verified; the results indicate that, with the strategy, the rim height decreases from 2.6 μm to 1.52 μm, and maximal photo thermal absorption is decreased from 784.2 PPM to 209.43 PPM.

Single-crystal silicon carbide has excellent electrical, mechanical, and chemical properties. However, due to its high hardness material properties, achieving high-precision manufacturing of single-crystal silicon carbide with an ultra-smooth surface is difficult. In this work, quantum dots were introduced as a sacrificial layer in polishing for pulsed-ion-beam sputtering of single-crystal SiC. The surface of single-crystal silicon carbide with a quantum-dot sacrificial layer was sputtered using a pulsed-ion beam and compared with the surface of single-crystal silicon carbide sputtered directly. The surface roughness evolution of single-crystal silicon carbide etched using a pulsed ion beam was studied, and the mechanism of sacrificial layer sputtering was analyzed theoretically. The results show that direct sputtering of single-crystal silicon carbide will deteriorate the surface quality. On the contrary, the surface roughness of single-crystal silicon carbide with a quantum-dot sacrificial layer added using pulsed-ion-beam sputtering was effectively suppressed, the surface shape accuracy of the Ø120 mm sample was converged to 7.63 nm RMS, and the roughness was reduced to 0.21 nm RMS. Therefore, the single-crystal silicon carbide with the quantum-dot sacrificial layer added via pulsed-ion-beam sputtering can effectively reduce the micro-morphology roughness phenomenon caused by ion-beam sputtering, and it is expected to realize the manufacture of a high-precision ultra-smooth surface of single-crystal silicon carbide.

This paper presented a conformal smoothing theory, and smoothing capability evaluation was established on the proposed theory. According to pressure distribution model, processing parameters have been optimized and the CPP sample with a size of 340 × 340 mm was applied in conformal smoothing. The middle spatial frequency was effectively corrected with the total polishing time of 750 min, and energy was constringed 32.2 times (improved from 57.68 nm²·mm to 1.79 nm²·mm). Meanwhile, surface roughness RMS (root mean square) maintained at the same scale (changed from 265.4 nm to 265.2 nm). Parametric conformal smoothing was proven to be an effective method to control the middle spatial frequency error of CPPs.