Transparent barrier coatings on polymers are receiving much attention in industry, for pharmaceutical, food and beverage packaging applications. Plasma-enhanced chemical vapor deposition (PECVD) is among several competing techniques which can produce thin layers of inorganic glassy barrier materials. In this article we describe the performance of silicon compounds (SiO2 and Si3N4) on 13 μm polyethylene terephthalate (PET) substrates, the barrier coatings being deposited in a dual-frequency (microwave/radio frequency) pilot-scale PECVD reactor for continuously moving flexible webs up to 30 cm in width. The volatile silicon compound used for SiO2 deposition is HMDSO (C6H18Si2O), while SiH4 serves to deposit Si3N4. Coating thicknesses, d, in the range 8 nm⩽d⩽200 nm, are measured using a variety of techniques, namely stylus profilometry, continuous wavelength optical interferometry, x-ray fluorescence, variable angle spectroscopic ellipsometry, and transmission electron microscopy, while film compositions are determined by x-ray photoelectron spectroscopy. Oxygen transmission (OTR) and water vapor transmission (WVTR) measurements are carried out with MOCON “Oxtran” and “Permatran-W” instruments, respectively. As also reported by other workers, we typically find OTR values of about 0.5 scc/m2 day and WVTR about 0.3 g/m2 day, for barrier thicknesses exceeding a “critical” value (dc, about 15 nm), but the minimum permeation values depend upon the concentration of defect sites in the coating (mostly related to substrate microroughness). In order to confirm this correlation, we have developed a technique combining reactive ion etching through the PET, followed by optical and transmission electron microscopies, to characterize the types and number densities of coating defects. On the basis of these, we find good agreement between measured and calculated values of OTR.

In this study, the potential antimicrobial activity of plasma-activated tap water (PAW) was evaluated against Staphylococcus aureus, Escherichia coli, and Candida albicans. For this, PAW was prepared in a gliding arc plasma system using two treatment conditions: stagnant water and water stirring by a magnetic stirrer, called moving water. Subsequently, their oxidation-reduction potential (ORP), pH, electrical conductivity (σ), and total dissolved solids (TDS) were monitored in different areas of the sample divided according to the depth of the beaker. It was observed that PAW obtained in dynamic conditions showed a more uniform acidity among the evaluated areas with pH 3.53 and ORP of 215 mV. Finally, standardized suspensions of Staphylococcus aureus (ATCC 6538), Escherichia coli (ATCC 10799), and Candida albicans (SC 5314) were treated with PAW, and the reduction of viable cells determined the antimicrobial effect. Our results indicate that the tap water, activated by plasma treatment using gliding arc, is an excellent inactivation agent in the case of Staphylococcus aureus and Escherichia coli. On the other hand, no significant antimicrobial activity was achieved for Candida albicans.

The “interphase” region between the deposited layer [e.g., plasma-enhanced chemically vapor deposited (PECVD) SiO2 or SiN] and the poly(ethylene terephthalate) (PET) substrate has been investigated and compared to physical vapor deposited (PVD) (electron beam evaporated) SiO2. Composition profiles determined by time-of-flight elastic recoil detection, electron microprobe analysis, and x-ray photoelectron spectroscopy all show an extended interphase region more than 50 nm in width, while the profile of the PVD SiO2 is narrower. However, since these analytical techniques are invasive and prone to artifacts, we have also examined ultrathin (about 10 and 20 nm) SiO2 and SiN PECVD layers on 50 nm spin-coated PET substrates by nondestructive infrared (IR) techniques. The IR spectra confirm that the thin PECVD deposits also comprise an organosilicon phase with Si–CHx bonds. We explain these observations in terms of a fragmentation/redeposition mechanism: During the earliest stage of PECVD, interaction between the plasma and the polymer surface produces volatile organic species, which intermix with the reagent gas feed, thus giving rise to the observed organosilicon-like deposit with gradually decreasing carbon content.

Black TiO₂ materials have been quite widely explored due to their large solar absorption and superior photocatalytic activity. In this paper, the blackening process of titanium dioxide (TiO₂) thin film using the hollow cathode hydrogen plasma (HCHP) technique is reported. First, pristine anatase TiO₂ films were grown by magnetron sputtering onto silicon and cover glass substrates and then annealed at 450 °C for 2 h. Then, the as-grown TiO₂ films were treated with HCHP for 15 min. The physical, chemical and morphological properties of the films were analyzed by profilometry, X-ray diffraction (XRD), UV-Vis spectrophotometry, Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) techniques. Electrical and photocatalytic measurements were performed by four-point probe and methylene blue UV degradation assays, respectively. The results showed that the black TiO₂ film is highly absorbent in the UV-visible region, has low electrical resistance and greater surface area compared to the non-treated TiO₂ film. These properties of black TiO₂ film, as well as its performance as a photocatalytic agent, were investigated, indicating the superior quality of this material in thin film form and the promising potential of the HCHP treatment to produce hydrogenated TiO₂ in short process time.